The SPIE Advanced Lithography 2007 symposium is the largest event focusing on R&D in the semiconductor industry. More than 1000 attendees packed the hall to hear speakers and panelists talk about new developments that will shape the industry in the near future.
 | Johannes M.C. (Hans) Stork, Senior Vice President and Chief Technology Officer, Texas Instruments Inc. doi:10.1117/2.3200703.0001 |
 | George A. Gomba, IBM Distinguished Engineer and Director of Lithography Technology Development, IBM Corp. doi:10.1117/2.3200703.0002 |
 | Mark Melliar-Smith, CEO, Molecular Imprints, Inc. doi:10.1117/2.3200703.0003 |
Panel Discussion:
Chairs:
Mircea V. Dusa, ASML MaskTools Inc.
Nigel R. Farrar, CYMER, Inc.
In this panel discussion, nine experts discuss the outlook for automated algorithms, engineering analysis and simulation driving next-generation lithography. Panelists include: Andy Neureuther, Univ of California, Berkeley; Alfred Wong, Magma Design Systems; Neal Callan, Brion Technologies, Inc.; Scott Mansfield, IBM Microelectronics Div.; Tatsuhiko Higashiki, Toshiba; Cyrus Tabery, Advanced Micro Devices; Kurt Ronse, IMEC; Steve Renwick, Nikon Precision; and Koichiro Tsujita, Canon.
Video coverage sponsored by CYMER, Inc.
doi:10.1117/2.3200703.0004
Click here to watch the video