Rochester Riverside Convention Center
    Rochester, New York, United States
    16 - 19 October 2017
    Print PageEmail Page


    Optifab, organized jointly by SPIE and APOMA, is the largest optical manufacturing conference and exhibition held in the United States.

    With a unique technical focus on classical and advanced optical manufacturing technologies, Optifab offers conference attendees an exceptional opportunity to interact with worldwide experts in the field of optical fabrication. We invite you to actively participate in the technical program by joining us for Optifab 2015.

    RESEARCHERS — Present your latest technical results. Researchers can present a paper or poster in a variety of optical manufacturing topic areas.

    INDUSTRY— Present your latest product breakthrough. Companies can highlight their latest developments optical manufacturing.

    We encourage you to further view our web site and hope you will consider joining us this fall in Rochester. 

    2015 Conference Chairs

     Julie Bentley

    Julie Bentley, 
    University of Rochester 

     Sebastian Stoebenau

    Sebastian Stoebenau, 
    OptoTech Optikmaschinen GmbH (Germany)

    2015 Program Committee

    Thomas Battley, New York Photonics Industry Association (USA)
    Michael J. Bechtold, OptiPro Systems (USA)
    Christopher T. Cotton, ASE Optics (USA)
    Walter C. Czajkowski, Edmund Optics, Inc. (USA)
    Thomas Danger, Schneider GmbH & Co. KG (Germany)
    Michael A. DeMarco, QED Technologies, Inc. (USA)
    Apostolos Deslis, JENOPTIK Optical Systems, Inc. (USA)
    Toshihide Dohi, OptiWorks, Inc. (Japan)
    Tom Godin, Satisloh North America Inc. (USA)
    Heidi Hofke, OptoTech Optical Machinery Inc. (USA)
    Jay Kumler, JENOPTIK Optical Systems, Inc. (USA)
    Justin J. Mahanna, Universal Photonics Inc. (USA)
    Michael Marcus, Lumetrics (USA)
    Paul Meier-Wang, AccuCoat Inc. (USA)
    Ted Mooney, ITT Exelis (USA)
    Richard A. Nasca, Corning Tropel Corp. (USA)
    Michael N. Naselaris, Sydor Optics, Inc. (USA)
    Richard Nastasi, Universal Photonics Inc. (USA)
    John J. Nemechek, Metrology Concepts LLC (USA)
    Buzz Nesti, Naked Optics Corp. (USA)
    Matthias Pfaff, OptoTech Optikmaschinen GmbH (Germany)
    Paul R. Tolley, Smart System Technology & Commercialization Ctr. (USA)
    Martin J. Valente, Arizona Optical Systems, LLC (USA)
    Kirk J. Warden, LaCroix Optical Co. (USA)
    Robert Anton Wiederhold, Optimax Systems, Inc. (USA)


    SPIE logo