Conferences & Exhibitions Calendar
Print PageEmail Page
SPIE Optical Metrology 23 - 26 May 2011
ICM—International Conference Centre Munich
Munich, Germany

About Event

Welcome to Munich!

Enjoy this opportunity to interact with scientists, engineers, researchers, and applications and product developers in the field of optics and laser applications in metrology and art and archaeology conservation. Colocated with Laser 2011 in Munich, Germany, this symposium will address the role of lasers in the following areas:

  • Optical Measurement Systems for Industrial Inspection
  • Modeling Aspects in Optical Metrology
  • O3A: Optics for Arts, Architecture, and Archaeology
  • Videometrics, Range Imaging and Applications

You will have a unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering. Learn about recent advances in using optical technologies to preserve our shared cultural heritage. Find out about new approaches that push optical principles of measurement and testing in the micro- and nanoscales to the forefront of optical metrology.

Exchange new ideas, address your shared concerns, and get access to information not yet published in these topical areas. We are glad that you are here to share the most recent developments and applications at the 2011 Optical Metrology Symposium.

Symposium Chairs:

 

Wolfgang Osten
Univ. Stuttgart
(Germany)

Malgorzata Kujawinska
Warsaw Univ. of Technology
(Poland)



Pietro Ferraro
Istituto Nazionale
di Ottica Applicata
(Italy)

Bernd Bodermann, Physikalisch-Technische Bundesanstalt ( Germany)
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)
Pietro Ferraro, Istituto Nazionale di Ottica Applicata (Italy)
Kay Gastinger, SINTEF (Norway)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Peter Lehmann, Univ. Kassel (Germany)
Wolfgang Osten, Univ. Stuttgart (Germany)
Luca Pezzati, National Institute of Applied Optics/CNR (Italy)
Fabio Remondino, FBK Trento (Italy)
Renzo Salimbeni, Institute of Applied Physics "N. Carrara"/CNR (Italy)
Richard M. Silver, NIST (USA
Mark Shortis, RMIT University (Australia)


Advisory Committee

Werner Jüptner, Bremer Institut für angewandte Strahltechnik (Germany)
Ralph P. Tatam, Cranfield Univ. (UK)

Important Dates

Abstract Due Date
16 December 2010

Author Notification
18 February 2011

Onsite Manuscripts Due 
14 March 2011

Post-Meeting Manuscripts Due
25 April 2011


Sign Up for Email Updates
Receive email updates on SPIE Optical Metrology.