• Optical Metrology 2013
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    Proceedings
ICM Munich
Munich, Germany
13 - 16 May 2013
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Invitation

Welcome to Munich!

We welcome you to take this opportunity to attend SPIE Optical Metrology 2013. Come to Munich to meet with users and researchers to discuss the latest inventions and applications in the field of optical metrology. The symposium will highlight new optical principles and systems for metrology, videometrics and machine vision with applications in industrial design, production engineering, process monitoring, maintenance support, biotechnology, vehicle navigation, multimedia technology, architecture, archaeology and arts. Special emphasis is directed to model-based, remote and active approaches, sensor fusion, robot guidance, image sequence processing and scene modelling, biomaterials characterization as well as to the preservation of our shared cultural heritage.

We invite engineers, scientists, researchers, trustees and managers to attend this year’s meeting.  Co-located with Laser 2013 in Munich, Germany, this symposium will address the role of optics and lasers in the following areas:

•         Optical Measurement Systems for Industrial Inspection
•         Modeling Aspects in Optical Metrology
•         Optical Methods for Inspection, Characterization and Imaging of Biomaterials
•         Videometrics, Range Imaging and Applications
•         Automated Visual Inspection
•         Optics for Arts, Architecture, and Archaeology
•         Industry Meets Academia

Take advantage of this unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering. Learn about recent advances in using optical technologies to preserve our shared cultural heritage.  Find out about new approaches that push optical principles of measurement and testing at the macro, micro- and nanoscales to the forefront of metrology. Exchange new ideas, address your shared concerns, and get access to information not yet published in the mentioned topical areas. Share your research with other engineers, scientists, researchers, and managers.  Presentations will be permanently archived in the SPIE Digital Library, and made available to others in the international scientific community who seek to learn, make discoveries, and innovate.

We invite you to join your colleagues and share the most recent developments and applications at SPIE Optical Metrology 2013.

Symposium Chairs:

 

Wolfgang Osten
Univ. Stuttgart
(Germany)

Karsten Buse                                               
Fraunhofer-Institut für Physikalische Messtechnik IPM (Germany)

 

Andrew J. Moore

Heriot-Watt Univ. (United Kingdom)

Important Dates

Abstract Due Date
17 December 2012

Author Notification
11 February 2013

Onsite Manuscripts Due
 11 March 2013

Post-Meeting Manuscripts Due
18 April 2013
Volume 8790 only (Optics for Art, Architecture and Archaeology)


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