Conferences & Exhibitions Calendar
Print PageEmail Page
SPIE Europe Optical Metrology 14 - 18 June 2009
ICM-International Conference Centre Munich
Munich, Germany

About Event

We encourage you to join us at SPIE Europe Optical Metrology later this year. Come to Munich to meet with scientists, engineers, researchers, and applications and product developers in the field of optics and laser applications in metrology and art and archaeology conservation.

Co-located with Laser 2009 in Munich, Germany, this symposium will address the role of lasers in the following areas:

  • Optical Measurement Systems for Industrial Inspection
  • Modeling Aspects in Optical Metrology
  • O3A: Optics for Arts, Architecture, and Archaeology

You will have a unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering. Learn about recent advances in using optical technologies to preserve our shared cultural heritage. Find out about new approaches that push optical principles of measurement and testing in the micro- and nanoscales to the forefront of optical metrology.

Exchange new ideas, address your shared concerns, and get access to information not yet published in these topical areas. 

We invite all those involved in related industries to join their colleagues and share the most recent developments and applications at the 2009 Optical Metrology Symposium.

Symposium Chairs:

 

Wolfgang Osten
Univ. Stuttgart
(Germany)

Malgorzata Kujawinska
Warsaw Univ. of Technology
(Poland)



Pietro Ferraro
Istituto Nazionale
di Ottica Applicata
(Italy)


Technical Committee

Bernd Bodermann, Physikalisch-Technische Bundesanstalt ( Germany)
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)
Pietro Ferraro, Istituto Nazionale di Ottica Applicata (Italy)
Christophe Gorecki, Univ. de Franche-Comté (France)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Peter Lehmann, Univ. Kassel (Germany)
Wolfgang Osten, Univ. Stuttgart (Germany)
Luca Pezzati, National Institute of Applied Optics/CNR (Italy)
Renzo Salimbeni, Institute of Applied Physics "N. Carrara"/CNR (Italy)
Richard M. Silver, NIST (USA)


Advisory Committee

Werner Jüptner, Bremer Institut für angewandte Strahltechnik (Germany)
Ralph P. Tatam, Cranfield Univ. (UK)

Important Dates

Abstract Due Date
26 January 2009

Author Notification
16 February 2009

Onsite Manuscripts Due
6 April 2009

Post-Meeting Manuscripts Due
28 May 2009


Sign Up for Email Updates
Receive email updates on SPIE Optical Metrology.