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MOSAIC: a new wavefront metrology (Proceedings Paper)

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Metrology, Inspection, and Process Control for Microlithography XXIII, John A. Allgair; Christopher J. Raymond, Editors, 72720B

Date: 23 March 2009

Paper Abstract

MOSAIC is a new wavefront metrology that enables complete wavefront characterization from print or aerial image based measurements. Here we describe MOSAIC and verify its utility with a model-based proof of principle.
DOI: 10.1117/12.814303
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