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Benchmarking EUV mask inspection beyond 0.25 NA (Proceedings Paper)

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Photomask Technology 2008, Hiroichi Kawahira; Larry S. Zurbrick, Editors, 71222E

Date: 17 October 2008

Paper Abstract

The SEMATECH Berkeley Actinic Inspection Tool (AIT) is an EUV zoneplate microscope dedicated to photomask research. Recent upgrades have given the AIT imaging system selectable numerical aperture values of 0.25, 0.30, and 0.35 (4 equivalent). The highest of which provides resolution beyond the current generation of EUV lithography research tools, giving above 75% contrast for dense-line features with 100-nm half-pitch on the mask, and above 70% for 88-nm half-pitch. To improve the imaging system alignm
DOI: 10.1117/12.801529
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