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Utilization of EWMA-type charts for critical dimension metrology tools (Proceedings Paper)

Author(s): Joel T. Buser
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23rd Annual BACUS Symposium on Photomask Technology, Kurt R. Kimmel; Wolfgang Staud, Editors, pp.1297-1306

Date: 17 December 2003

Paper Abstract

Previous research suggests that the collection and testing of measure-to-measure and day-to-day variation across a multi-site operation in a standard real-time Statistical Process Control (SPC) solution can be problematic at best. Replicating the full measurement process for mean and range in real-time not only strains resources, but may not provide an adequate indicator of measure-to-measure variation, thus resulting in exceedingly narrow control limits for day-to-day variation. A proposed solution to thi
DOI: 10.1117/12.517843
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