Utilizing effective statistical process control limits for critical dimension metrology (Proceedings Paper)

To accurately control critical dimension (CD) metrology in a standard real-time solution across a multi-site operation there is a need to collect measure-to-measure and day-to-day variation across all sites. Each individual site's needs, technologies, and resources can affect the final solution. A preferred statistical process control (SPC) solution for testing measure-to-measure and day-to-day variation is the traditional Mean and Range chart. However, replicating the full measurement process needed for

DOI: 10.1117/12.467502
Current SPIE Digital Library subscribers click here to download this paper.

© SPIE - Downloading of the abstract is permitted for personal use only.
See Terms of Use