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SPIE Photomask Technology 10 - 12 September 2013
Monterey Conference Center and Monterey Marriott
Monterey, California, United States

Plan To Attend!

On behalf of SPIE, BACUS, and the Organizing Committee, we invite you to attend the 33rd Annual SPIE/BACUS Photomask Symposium in Monterey, California.

This annual meeting continues to be the premier worldwide technical meeting for the Photomask industry. The conference will give all attendees a condensed and up-to-date overview of the Photomask industry. The various sessions will include presentations and poster papers that span a number of critical topics in the Photomask Industry. These include current technical issues, emerging technologies, and future trends. It will also give the authors an opportunity to present their exciting research findings that relate to the emerging technical challenges facing the Photomask industry to a large international audience of their peers. We have received over 95 presentations this year, covering all aspects of mask making, mask application and related technologies.

The official opening session will be on Tuesday morning, September 10, with a Keynote Presentation that you will not want to miss titled "Delivering Complexity at the Frontier of Electronics"! The conference will follow a single track three day event. This means all presentations will be in one room avoiding the need to hop between rooms to catch your favorite paper. The first two days of the conference will feature larger sessions focused on single topics such as OPC/Simulation and Mask Contamination/Long Term Durability. In addition, we will have a session that will be focused exclusively one-beam direct write. EUV masks are now part of the mainstream of mask technology. To affirm this statement, all individual mask-related tasks of EUV will be part of their regular topic. We will begin day 3 with Paul Ackmann leading the panel discussion on the topic of: "Big Bad Glass: Will nine inch glass return?"  This subject is sure to provide lively discussion and debate amongst industry experts.

We hope that you will be joining us in beautiful Monterey, California 10-12 September 2013. Not only will you have a great experience attending the sessions, you will also have fun on the California coast in the middle of its best season!

 

Tom Faure

Thomas B. Faure
IBM Corp.
2013 Symposium Chair

 

Paul Ackmann

Paul W. Ackmann
GLOBALFOUNDRIES Inc.
2013 Symposium Co-Chair

 


 

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Important Dates

Abstract Due Date
Please contact Pat Wight with late submission questions

Author Notifications
10 June 2013

Manuscripts Due
12 August 2013


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