• Photomask Technology 2015
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Monterey Conference Center and Monterey Marriott
Monterey, CA , United States
29 September - 1 October 2015
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On behalf of SPIE, BACUS, and the Organizing Committee, we welcome you to the 35th Annual SPIE/BACUS Photomask Symposium in Monterey, California. This annual meeting continues to be the premier worldwide technical meeting for the photomask industry. Once again, the Scanning Microscopies conference will co-locate with us in the Monterey Conference Center. Attendees will be allowed to attend presentations from both conferences.

The conference will give all attendees an up-to-date overview of the photomask industry. The various sessions will include presentations and poster papers that span a number of critical topics in the photomask industry. These include current technical issues, emerging technologies, and future trends. It will give the authors an opportunity to present their exciting research findings related to the emerging technical challenges facing the photomask industry to a large international audience of their peers. We have received approximately 100 presentations this year, including the Scanning Microscopies joint contributions, covering all aspects of mask making, mask application, and related technologies.

The official opening session will be on Tuesday morning, 29 September with the Keynote Presentation from Harry J. Levinson of GLOBALFOUNDRIES titled “Lithography and Mask Challenges at the Leading Edge”. We will have 2 joint sessions with the Scanning conference. We continue the single track, three-day event, which means all presentations will be in one room. A Student session has been added on Tuesday to hopefully encourage students to participate on Photomask.

EUV lithography seems to be now ready for production with recent good progress of related technologies. We will continue to have the Panel Discussion and finish the discussion just before lunch on Thursday. This panel is titles “EUV Mask Readiness: Do we finally kick the ball?” and moderated by Bryan S. Kasprowicz of Photronics. A good cross section of panelists has been assembled for a timely discussion amongst industry experts.

Welcome to beautiful Monterey. We hope you will have a great experience attending the sessions and you enjoy your time on the beautiful California coast in the middle of its best season.

Naoya Hayashi

Naoya Hayashi
Dai Nippon Printing Co., Ltd.
2015 Symposium Chair


Bryan S. Kasprowicz

Bryan S. Kasprowicz
Photronics, Inc.
2015 Symposium Co-Chair



2015 BACUS Steering Committee

Frank Abboud, Intel Corp.
Paul C. Allen, Toppan Photomasks, Inc.
Michael D. Archuletta, RAVE LLC
Artur Balasinski, Cypress Semiconductor Corp.
Uwe F. W. Behringer, UBC Microelectronics
Peter D. Buck, Mentor Graphics Corp.
Brian Cha, Samsung Electronics Co., Ltd.
Brian J. Grenon, Grenon Consulting
Jon Haines, Micron Technology Inc.
Naoya Hayashi, Dai Nippon Printing Co., Ltd.
Mark Jee, HOYA Corp. USA
Bryan S. Kasprowicz, Photronics, Inc.
Patrick M. Martin, Applied Materials, Inc.
M. Warren Montgomery, College of Nanoscale Sciences & Engineering (CNSE)
Wilbert Odisho, KLA-Tencor, Inc.
Michael T. Postek, National Institute of Standards and Technology
Abbas Rastegar, SEMATECH North
Douglas J. Resnick, Canon Nanotechnologies, Inc.
Bala Thumma, Synopsys, Inc.
Jacek K. Tyminski, Nikon Research Corp. of America
Thomas Struck, Infineon Technologies AG
Michael Watt, Shin-Etsu MicroSi, Inc.
Jim N. Wiley, ASML US, Inc.
Larry S. Zurbrick, Keysight Technologies, Inc.


Important Author Dates

Late Abstract Submissions may be accepted by the conference chairs.
Please send them to Pat Wight.

Author Notifications were sent out 12 June 2015

Manuscripts Due
31 August 2015

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