In 2012, masks will continue to be the key differentiating elements in optical lithography as well as enabling EUV lithography. Further, our mask industry will be challenged to extend optical lithography yet one more node while much effort and resources are focused on the EUV promise. As mask makers, once again we need to excel at EUV, double patterning, ILT, NIL, and all the other varieties of photolithography. More and more we see the Litho error budget putting more burden to the mask. In a way the mask is an enabler, but also contains an increasing list of challenges.
The 32nd Annual Photomask Symposium, organized by SPIE and BACUS, the International Technical Group of SPIE, provides the forum to present the newest findings, to discuss the most exciting trends, to ponder reliable solutions in this rapidly developing industry, and their effects on the semiconductor lithography.
As Symposium Chair and Symposium Co-Chair, we urge you to participate, to encourage your colleagues to participate, and most of all, encourage your company to continue to support Photomask.
It should be another great year in Monterey!
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Frank E. Abboud
Intel Corp.
2012 Symposium Chair
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Thomas B. Faure
IBM Corp.
2012 Symposium Co-Chair
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