• Photomask Technology 2015
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Monterey Conference Center and Monterey Marriott
Monterey, CA , United States
29 September - 1 October 2015
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Plan to Participate

On behalf of SPIE, BACUS, and the Organizing Committee, we invite you to attend the 35th Annual SPIE/BACUS Photomask Symposium in Monterey, California.

In 2015, mask making and mask makers continue to support the requirements for more complex optical extensions to realize 10 nm and below. These elements will continue to put pressure on the industry. The mask makers must excel at optical multiple patterning, EUV, NIL, DSA and all the other varieties of photolithography to support the wafer technology with patterning solutions. As EUV lithography continues to move closer to volume manufacturing we shall focus on EUV reticles and related infrastructures as a key enabler. We also continue to discuss how 450mm wafers implementation, scaling of non-IC patterning such as display panel and MEMS, will impact the mask industry.

This year we start the conference off with a Keynote Presentation from Harry J. Levinson, GLOBALFOUNDRIES Inc. We have 2 joint sessions planned with the co-located Scanning Microscopies conference.

We hope that you will be joining us in beautiful Monterey, California 29 September - 1 October 2015. Not only will you have a great experience attending the sessions, you will also have fun on the California coast in the middle of its best season!

Naoya Hayashi

Naoya Hayashi
Dai Nippon Printing Co., Ltd.
2015 Symposium Chair

 

Bryan S. Kasprowicz

Bryan S. Kasprowicz
Photronics, Inc.
2015 Symposium Co-Chair

 

 

2015 BACUS Steering Committee

Frank Abboud, Intel Corp.
Paul Ackmann, GLOBALFOUNDRIES Inc.
Paul C. Allen, Toppan Photomasks, Inc.
Michael D. Archuletta, RAVE LLC
Artur Balasinski, Cypress Semiconductor Corp.
Uwe F. W. Behringer, UBC Microelectronics
Peter D. Buck, Mentor Graphics Corp.
Brian Cha, Samsung Electronics Co., Ltd.
Michael Watt, Shin-Etsu MicroSi, Inc.
Thomas B. Faure, IBM Corp.
Brian J. Grenon, Grenon Consulting
Jon Haines, Micron Technology Inc.
Naoya Hayashi, Dai Nippon Printing Co., Ltd.
Mark Jee, HOYA Corp. USA
Bryan S. Kasprowicz, Photronics, Inc.
Patrick M. Martin, Applied Materials, Inc.
M. Warren Montgomery, College of Nanoscale Sciences & Engineering (CNSE)
Wilbert Odisho, KLA-Tencor, Inc.
Michael T. Postek, National Institute of Standards and Technology
Abbas Rastegar, SEMATECH North
Emmanuel Rausa, Consultant
Douglas J. Resnick, Canon Nanotechnologies, Inc.
Bala Thumma, Synopsys, Inc.
Jacek K. Tyminski, Nikon Research Corp. of America
Thomas Struck, Infineon Technologies AG
Jim N. Wiley, ASML US, Inc.
Larry S. Zurbrick, Keysight Technologies, Inc.


 

Important Author Dates

Late Abstract Submissions may be accepted by the conference chairs.
Please send them to Pat Wight.

Author Notifications were sent out 12 June 2015

Manuscripts Due
31 August 2015


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