• Photomask Technology 2015
    Entire Program
    Special Events
    Travel to Monterey
    Onsite Services
    Registration Pricing + Details
    For Authors/Presenters
    For Chairs/Committees
    For Exhibitors
Monterey Conference Center and Monterey Marriott
Monterey, CA , United States
29 September - 1 October 2015
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SPIE Photomask Technology 2015

SPIE Photomask Technology 2015

SPIE Photomask Technology 2015, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.

Thank you to all who participated in the 2015 event, we look forward to next year.
12-14 September 2016
San Jose, California, USA

Registration pricing and details View registration pricing and details
2015 Final Program Download the Final Program (5 MB PDF)
Download Technical Abstracts (700 KB PDF)
View Hotel Information View Hotel Information
2015 Topics
Mask Making:
Mask data preparation • Substrates and materials • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV:
Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
Emerging Mask Technologies:
EUV mask making • EUV mask inspection and repair • EUV mask infrastructure • EUV mask application • Nanoimprint mask making • Nanoimprint mask application • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML²
Mask Business:
Mask manufacturing control • Mask shop management • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
2015 Keynote Presentation
Harry J. Levinson

Lithography and Mask Challenges at the Leading Edge

Harry J. Levinson 
Sr. Director Technology Research

2015 Special Sessions
 • EPE Computation in the Era of Multi-Patterning
 • Mask Technologies for Alternative Lithography
 • EUV Mask Readiness
 • Student Session and Best Paper Awards—Calling All Students
Co-located with SPIE Scanning Microscopies 2015
SPIE Photomask Technology is co-located with SPIE Scanning Microscopies 2015, a multidisciplinary conference for advancing scanning microscopy technologies and applications. Two conferences for one registration, plus access to multidisciplinary connections and information.
SPIE Scanning Microscopies
Monterey Conference Center and Monterey Marriott
Monterey, California, United States
29 September - 1 October 2015


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Important Author Dates

Manuscripts Due
31 August 2015

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