Journal of Micro/Nanolithography, MEMS, and MOEMS Editorial Board

Chris A. Mack
Lithoguru.com
USA

William H. Arnold
ASML
USA

Yu-Cheng Lin
National Cheng Kung Univ.
Taiwan

M. Edward Motamedi
Revoltech Microsystems
USA

Thomas J. Suleski
Univ. of North Carolina at Charlotte
USA

Burn J. Lin
Taiwan Semiconductor Manufacturing Co., Ltd.
Taiwan

Jos Benschop
ASML
Netherlands

Ralph Dammel
AZ Electronic Materials
USA

David L. Dickensheets
Montana State Univ.
USA

Weileun Fang
National Tsing Hua Univ.
Taiwan

Gary K. Fedder
Carnegie Mellon University
USA

Donis Flagello
Nikon Research Corp. of America
USA

John Hartley
State Univ. of New York, Albany
USA

Tatsuhiko Higashiki
Toshiba Corp.
Japan

Winfried Kaiser
Carl Zeiss
Germany

Randall L. Kubena
HRL
USA

Stephen M. Kuebler
Univ. of Central Florida
USA

Timothy P. Kurzweg
Drexel Univ.
USA

Qinghuang Lin
IBM Thomas J. Watson Research Center
USA

Robin Liu
CombiMatrix Corp.
USA

Ru-Gun Liu
Taiwan Semiconductor Manufacturing Co Ltd
Taiwan

Roya Maboudian
Univ. of California, Berkley
USA

Katsuhiko Murakami
Nikon Corporation
Japan

Shinji Okazaki
EUVA
Japan

Soichi Owa
Nikon
Japan

Ian Papautsky
Univ. of Cincinnati
USA

Hans C. Pfeiffer
HCP Consulting Services
USA

Moshe Preil
ASML
USA

Chris Progler
Photronics, Inc.
USA

Rajeshuni Ramesham
Jet Propulsion Lab.
USA

Douglas J. Resnick
Imprints, Inc.
USA

John Rogers
Univ. of Illinois at Urbana-Champaign
USA

Kurt Ronse
IMEC
Belgium

Harald Schenk
Fraunhofer Inst. für Photonische Mikrosysteme
Germany

Richard M. Silver
National Institute of Standards and Technology
USA

Stefan Sinzinger
Technische Univ. Ilmenau
Germany

Jeffry Sniegowski
MEMX, Inc.
USA

Srinivas Tadigadapa
Pennsylvania State Univ.
USA

Vijay K. Varadan
Univ. of Arkansas
USA

Wanjun Wang
Louisiana State Univ.
USA

Anthony Yen
Taiwan Semiconductor Manufacturing Co., Ltd.
Taiwan

Hans Zappe
Univ. of Freiburg
Germany