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Journal of Micro/Nanolithography, MEMS, and MOEMS Editorial Board

Editor-in-Chief

Chris A. Mack

Chris A. Mack
Lithoguru.com
USA

 

Senior Editors

William Arnold

William H. Arnold
ASML
USA

Yu-Cheng Lin

Yu-Cheng Lin
National Cheng Kung Univ.
Taiwan

Moshe Preil

Moshe Preil
GlobalFoundries
USA

Harald Schenk

Harald Schenk
Fraunhofer Inst. für Photonische Mikrosysteme
Germany

Thomas J. Suleski

Thomas J. Suleski
Univ. of North Carolina at Charlotte
USA

 

Associate Editors

Vivek Bakshi

Vivek Bakshi
EUV Litho, Inc.
USA

Jos Benschop

Jos Benschop
ASML
Netherlands

Peter Buck

Peter Buck
Toppan Photomasks, Inc
USA

Ralph Dammel

Ralph Dammel
AZ Electronic Materials
USA

David L. Dickensheets

David L. Dickensheets
Montana State Univ.
USA

Weileun Fang

Weileun Fang
National Tsing Hua Univ.
Taiwan

Donis Flagello

Donis Flagello
Nikon Research Corp. of America
USA

Gregg Gallatin

Gregg Gallatin
ASML
USA

Stephen M. Kuebler

Stephen M. Kuebler
Univ. of Central Florida
USA

Timothy P. Kurzweg

Timothy P. Kurzweg
Drexel Univ.
USA

Chengkuo Lee

Chengkuo Lee
National Univ. of Singapore
Singapore

Lars Liebmann

Lars Liebmann
IBM Corp.
USA

Qinghuang Lin

Qinghuang Lin
IBM Thomas J. Watson Research Center
USA

Robin Liu

Robin Liu
CombiMatrix Corp.
USA

Roya Maboudian

Roya Maboudian
Univ. of California, Berkley
USA

Katsuhiko Murakami

Katsuhiko Murakami
Nikon Corporation
Japan

Shinji Okazaki

Shinji Okazaki
Gigaphoton, Inc.
Japan

Soichi Owa

Soichi Owa
Nikon
Japan

Rajeshuni Ramesham

Rajeshuni Ramesham
Jet Propulsion Lab.
USA

Douglas J. Resnick

Douglas J. Resnick
Imprints, Inc.
USA

John Rogers

John Rogers
Univ. of Illinois at Urbana-Champaign
USA

Kurt Ronse

Kurt Ronse
IMEC
Belgium

Daniel P. Sanders

Daniel P. Sanders
IBM Almaden Research Center
USA

Richard M. Silver

Richard M. Silver
National Institute of Standards and Technology
USA

Stefan Sinzinger

Stefan Sinzinger
Technische Univ. Ilmenau
Germany

Jeffry Sniegowski

Jeffry Sniegowski
MEMX, Inc.
USA

Keith Standiford

Keith Standiford
GlobalFoundries
USA

Srinivas Tadigadapa

Srinivas Tadigadapa
Pennsylvania State Univ.
USA

Vijay K. Varadan

Vijay K. Varadan
Univ. of Arkansas
USA

Wanjun Wang

Wanjun Wang
Louisiana State Univ.
USA

Anthony Yen

Anthony Yen
Taiwan Semiconductor Manufacturing Co., Ltd.
Taiwan

Hans Zappe

Hans Zappe
Univ. of Freiburg
Germany

Past Editor

Burn Lin, Founding Editor, 2002-2011


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JM3 Facts and Figures

ISSN: 1932-5150
E-ISSN: 1932-5134
Publisher: SPIE
Frequency: Quarterly (4 issue/year)
Format: Print and Online
Impact Factor: 1.205
5-Year Impact Factor: 1.008 
Subject Category Rankings: 46th out of 82 journals in Optics; 57th out of 73 journals in Nanoscience & Nanotechnology; 127th out of 247 journals in Electrical & Electronic Engineering; 144th out of 251 journals in Multidisciplinary Materials Science
h5-index: 19