The Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) (formerly the Journal of Microlithography, Microfabrication, and Microsystems, 2002-2006) publishes peer-reviewed papers on the development of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, micro-optoelectromechanical systems, and photonics industries. The scope is broad to facilitate synergy and interest between the communities served by the journal.
Topical areas covered include: tools, processes, and materials associated with the lithography of structures that have submicrometer features; technologies to shape three-dimensional structures leading to the fabrication of active and passive electronic, electromechanical, optoelectronic, and opto-electro-mechanical devices, as well as passive optical devices; and core processes and technologies necessary for packaging and integration, with a focus on wafer-scale and other volume integration methods.
Key topics include:
- Optical lithography
- Emerging lithographic systems and techniques
- Resolution enhancement techniques
- Innovative illumination and aperture filtering schemes
- Antireflection coatings
- Optical proximity correction
- Critical-dimension control
- Alignment
- Defect reduction
- Yield improvement
- Resist technology and processing
- Metrology
- Inspection
- Binary and phase-shifting mask technology
- Etching and patterning technologies
- Plating technologies
- Replication
- Surface micromachining
- Bulk micromachining
- Focused ion beam technologies
- Fabrication and lithography for three-dimensional systems
- MEMS/MOEMS
- Micro-optics
- Novel package design
- Modeling
- Enabling materials
- Interconnect technology
- Integration processes
- Wafer-scale packaging
- Three-dimensional packaging
- Active and passive alignment
- Alignment structures
- Microassembly
- Structural integrity
- Microcooling systems
- Microsystem design and applications
In addition to contributed research papers, JM3 occasionally includes special section papers in key areas of technology. Special sections are assembled by guest editors. See the Editorial Schedule for a list of forthcoming special section topics and dates.
JM3 Utilizes e-First Publication
SPIE Journals are published online in an article-at-a-time (or e-First) publication mode.
- Authors benefit from an accelerated publication process, with articles being published online as they are approved.
- Researchers gain access to research much earlier compared to print publication.
Additionally, JM3 uses six-digit citation identifiers (CIDs) instead of page numbers. For more information, see the Citation Format page.
Impact Factor (2007): 0.986
Rankings:
28th out of 46 journals in Nanoscience & Nanotechnology
87th out of 227 in Engineering, Electrical, & Electronics
94th out of 189 in Materials Science, Multidisciplinary
ISSN:
Current ISSN: 1932-5150 (print); 1932-5134 (online).
Previous ISSN (years 2002-2006)*: 1537-1646 (print); 1817-6461 (online).
*JM3 was published under the title
Journal of Microlithography, Microfabrication, and Microsystems from 2002-2006.
Abstracting and Indexing:
JM3 is abstracted and indexed in many leading scientific databases, including Science Citation Index Expanded; Materials Science Citation Index; Current Contents/Physical, Chemical & Earth Science; Current Contents/Engineering, Computing & Technology; Inspec; Scopus; Ei Compendex; and Chemical Abstracts.
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