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Micro/Nano Lithography

KLA-Tencor and SEMATECH partner to advance EUV lithography technology at UAlbany NanoCollege

21 June 2011

SEMATECH and KLA-Tencor Corporation today announced KLA-Tencor has joined SEMATECH's Lithography Defect Reduction program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

As a member of the Defect Reduction program, KLA-Tencor will collaborate with SEMATECH engineers at the industry-leading defect reduction center for extreme ultraviolet (EUV) tool and materials technology. Specific areas for collaboration include defect source identification and elimination using leading-edge metrology, printability and characterization methods to advance mask metrology infrastructure and metrology source development, as well as overall EUV manufacturability and extendibility.

Read the SEMATECH press release.