We encourage you to join us at SPIE Europe Optical Metrology later this year. Come to Munich to meet with scientists, engineers, researchers, and applications and product developers in the field of optics and laser applications in metrology and art and archaeology conservation.
Co-located with Laser 2009 in Munich, Germany, this symposium will address the role of lasers in the following areas:
Optical Measurement Systems for Industrial Inspection
Modeling Aspects in Optical Metrology
O3A: Optics for Arts, Architecture, and Archaeology
You will have a unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering. Learn about recent advances in using optical technologies to preserve our shared cultural heritage. Find out about new approaches that push optical principles of measurement and testing in the micro- and nanoscales to the forefront of optical metrology.
Exchange new ideas, address your shared concerns, and get access to information not yet published in these topical areas.
We invite all those involved in related industries to join their colleagues and share the most recent developments and applications at the 2009 Optical Metrology Symposium.
Warsaw Univ. of Technology
di Ottica Applicata
Bernd Bodermann, Physikalisch-Technische Bundesanstalt ( Germany)
Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)
Pietro Ferraro, Istituto Nazionale di Ottica Applicata (Italy)
Christophe Gorecki, Univ. de Franche-Comté (France)
Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland)
Peter Lehmann, Univ. Kassel (Germany)
Wolfgang Osten, Univ. Stuttgart (Germany)
Luca Pezzati, National Institute of Applied Optics/CNR (Italy)
Renzo Salimbeni, Institute of Applied Physics "N. Carrara"/CNR (Italy)
Richard M. Silver, NIST (USA)
Werner Jüptner, Bremer Institut für angewandte Strahltechnik (Germany)
Ralph P. Tatam, Cranfield Univ. (UK)