SPIE Advanced Lithography 2010

SPIE Advanced Lithography 2010 Plenary

SPIE Advanced Lithography concluded on Thursday 3 March 2011. The overall conference attendance increased 11% this year. It's exciting to see the semiconductor industry bouncing back. Thanks to everyone who helped to make this event a success.

Quote of the Day: “I came up to visit the exhibition and discovered some things I didn't even know existed and ideas I hadn't thought of before. This is a great place to meet smart people." - Brent Bergner, Spectrum Scientific

Program Information:

•	Daily News - See what happened in San Jose in 2011
•	Photo Gallery - View 2011 photos
•	View Final Technical Program (PDF)
•	View conference abstracts (PDF)
•	View conference proceedings in the SPIE Digital Library (coming soon)

SPIE Advanced Lithography is:
•	Over 550 technical presentations
•	A 50-company+ exhibition for the industry’s top semiconductor suppliers, integrators, and manufacturers.
•	12 courses - including EUV Lithography, Practical Photoresist Processing, and Electron Beam Inspection.
•	Panel Discussions, Awards, Workshops
•	Social and Networking Events
•	Valuable plenary sessions

Extreme Technology for a Sustainable World

Luc Van den hove,
President and CEO, IMEC (Belgium)

Thoughts on Extending Moore's Law
in the New Decade

Shang-Yi Chiang,
Senior VP, Taiwan Semiconductor (Taiwan)

Go to the current SPIE Advanced Lithography web page

SPIE Advanced Lithography 2011