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Micro/Nano Lithography

Updates from SPIE Advanced Lithography

SPIE Newsroom
24 February 2010

Nanotechnology in Microlithography panel discussion

The SPIE Advanced Lithography symposium, through February 26 in San Jose, is an important annual industry gathering. This year the mood is upbeat again, as increased attendance signals that the lithography industry is in a growth mode.

Onsite daily news updates from SPIE Advanced Lithography

Media reports from SPIE Advanced Lithography
EE Times:
EUV metrology doesn't add up
Directed self-assembly grabs spotlight at SPIE 
EUV delayed again. Now what?

Semiconductor International:
EUV Lith Still on the Defensive (podcast)
Maskmakers Struggle to Find the ROI on EUV Masks
SPIE Plenary Session Looks to EUV's Future, Changes During Economic Recovery

Blogs:
Directed self-assembly is the technology darling of the Advanced Lithography conference (Next Big Future)
Imprint, eBeam and Self Assembly all delay EUV Litho (Chip Design Blogs)