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18 - 19 November 2009
Sheraton Taipei Hotel
Taipei,
Taiwan |
Past Event Overview
| The second SPIE Lithography Asia conference featured presentations from leading researchers, developers, and innovators, and built on last year’s very successful conference. |  |
| Attendees enjoyed the outstanding plenary presentations from these industry leaders: | | • | Dr. Burn Lin, Senior Director, TSMC | | • | Dr. Kinam Kim, Executive VP and General Manager of R&D, Samsung | | • | Dr. Christopher J. Progler, Chief Technology Officer, Photronics, Inc. | | • | Dr. Cheng-Wen Wu, Director, ETRI Taiwan |
Symposium Chairs:
Alek C. Chen
ASML Taiwan Ltd.
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Woo-Sung Han
Samsung Electronics Co. Ltd.
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Burn Lin
Taiwan Semiconductor
Manufacturing Co. Ltd. | 
Anthony Yen
Taiwan Semiconductor
Manufacturing Co. Ltd. |
Conference topics include:
Emerging Lithographic Technology and Nanofabrication
| | Optical lithography extension (shorter than 157 nm) | | | EUV lithography | | | E- and ion- beam technology | | | Nano-imprint lithography | | | Application on nanostructures |
Optical Microlithography
| | ArF immersion lithography | | | RET technology | | | Double exposure/double patterning lithography | | | OPC modeling | | | Photo cluster automation |
Advances in Resist Material and Processing
| | Emerging resist materials | | | Advancement in immersion resists | | | Resist process optimizations | | | Resist material for LCD application | | | Double exposure material |
Metrology, Inspection, and Process Control
| | Advancement in CD metrology | | | Advancement in overlay metrology | | | Advancement in defect inspection | | | Process control for CD and overlay | | | Emerging metrology technology |
LCD Application
| | Imaging technology | | | Process control | | | Material technology | | | Automation and productivity |
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