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Micro/Nano Lithography

ASML to benefit from Nikon EUV litho delay

Nikon is said to have put on hold development of some of its extreme ultraviolet (EUV) tools, which could give ASML an early advantage in commercial deployments of the emerging chip making technology.

According to Richard Windsor, industry specialist at securities house Nomura, this is somewhat surprising as this technology was loudly touted earlier this year.

"Nikon at that time also discussed a 2012 shipment date but clearly that is now uncertain."

Windsor notes that by contrast ASML's EUV program looks "very much on track" and the Holland-based company "aims to ship beta tools to customers in the second half of 2010."

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