Measurement of thin film thickness on semiconductors, flat panel displays, MEMS and other devices in a production environment is now a common requirement for quality control. To service these needs, Elliot Scientific has begun offering the new QDI 2010 FilmTM microspectrophotometer from Craic Technologies to manufacturers and researchers in the UK and Ireland.
The QDI 2010 FilmTM is a specialised instrument developed from the existing QDI 2010 UV-VIS-NIR microspectrophotometer - the first ever to combine both UV microscopy and microspectroscopy in a single tool. The QDI 2010 FilmTM can measure the thickness of thin films covering sub-micron or larger sampling areas by either transmission or reflectance in a rapid and non-destructive fashion.
Using advanced microspectroscopy in conjunction with sophisticated software, the QDI 2010 FilmTM can analyse the film on both transparent and opaque substrates. Data analysis and recording is provided as standard, with the supplied processing routines suitable for use in a wide range of applications. If your requirements differ, the routines are easily modified to suit. Single and stacked films (up to four) can be measured down to a thickness of just a few nanometres.
The ability to directly image and measure films already make this instrument a powerful tool, but combine it with CRAIC Technologies proprietary contamination imaging capabilities via the optional UV microscopy upgrade and the QDI 2010 FilmTM becomes a superbly versatile and impressive instrument that's way ahead of the field.