Updated 13 January 2012
Updated monthly, each list includes a cross-disciplinary sampling of the most frequently downloaded papers from SPIE Conference Proceedings and SPIE Journal papers. Each title is linked to the abstract page for that paper on the SPIE Digital Library.
Astronomy: Large Binocular Telescope Adaptive Optics System: new achievements and perspectives in adaptive optics (Proceedings of SPIE)
Biomedical Optics & Medical Imaging: Tissue polarimetry: concepts, challenges, applications, and outlook (J. Biomedical Optics)
Defense & Security: Review of current aided/automatic target acquisition technology for military target acquisition tasks (Optical Engineering)
Electronic Imaging & Signal Processing: Toward a digital camera to rival the human eye (J. Electronic Imaging)
Illumination & Displays: Is solid state lighting ready for the incandescent lamp phase-out? (Proceedings of SPIE)
Lasers & Sources: Microfabrication by optical tweezers (Proceedings of SPIE)
Micro/Nano Lithography: Materials challenges for sub-20-nm lithography (J. Micro/Nanolithography, MEMS, and MOEMS)
Nanotechnology: Optical properties of nanostructured materials: a review (J. Nanophotonics)
Optical Design & Engineering: Compressed sensing for practical optical imaging systems: a tutorial (Optical Engineering)
Optoelectronics & Communications: High-power high-brightness semiconductor lasers based on novel waveguide concepts (Proceedings of SPIE)
Remote Sensing: Characterization of the Sonoran desert as a radiometric calibration target for Earth observing sensors (J. Applied Remote Sensing)
Sensing & Measurement: Roughness measurement of paper using speckle (Optical Engineering)
Solar & Alternative Energy: Simulation of energy harvesting from roads via pyroelectricity (J. Photonics for Energy)
Astronomy
Biomedical Optics & Medical Imaging
Defense & Security
Electronic Imaging & Signal Processing
Illumination & Displays
Micro/Nano Lithography
- EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100 (Proceedings of SPIE)
- Extreme ultraviolet–embedded phase-shift mask (J. Micro/Nanolithography, MEMS, and MOEMS)
- Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node (J. Micro/Nanolithography, MEMS, and MOEMS)
- Fabrication of five-layer three-dimensional miniature SU-8 axial fans using ultraviolet lithography (J. Micro/Nanolithography, MEMS, and MOEMS)
- Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result (J. Micro/Nanolithography, MEMS, and MOEMS)
- Materials challenges for sub-20-nm lithography (J. Micro/Nanolithography, MEMS, and MOEMS)
- Resolution enhancement optimization methods in optical lithography with improved manufacturability (J. Micro/Nanolithography, MEMS, and MOEMS)
- Source mask polarization optimization (J. Micro/Nanolithography, MEMS, and MOEMS)
- Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing (J. Micro/Nanolithography, MEMS, and MOEMS)
- Toward 22 nm: fast and effective intrafield monitoring and optimization of process windows and critical dimension uniformity (J. Micro/Nanolithography, MEMS, and MOEMS)
Nanotechnology
Optical Design & Engineering
Optoelectronics & Communications
Remote Sensing
Sensing & Measurement
Solar & Alternative Energy