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    Onsite News - Friday 29 February 2008

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       Innovation and Collaboration
       


    SPIE Advanced Lithography 2009 Ends on Notes of Innovation and Collaboration
     
     Attendees gather for a Friday coffee break.


    “An emphasis on the importance of innovation and the need for collaboration were themes in meeting rooms, hallways, and the exhibition hall throughout the week, as the Advanced Lithography community shared ideas for coping with the current economic slump and positioning for recovery and future growth. While overall attendance this year topped out at 2,700, lower than the peaks of the last several years, attendees brought energy and ideas to solving both economic and technological challenges.

    There was time for one more award as well on Friday morning. The Optical Microlithography Best Student Paper award was presented to Tamer Tawfik of Mentor Graphics and Ahmed Morshed and Diaa Khalil of Ain Shams Univ., Egypt, for their paper titled “Modeling mask scattered field at oblique incidence.” Sponsored by Cymer, the award includes a trophy and $2,500.

    With the last paper presentation in the early afternoon and the two final two conferences of the week adjourned, attendees headed back to their labs, universities, and offices.