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    Onsite News - Wednesday 25 February 2009

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    Day two of the Advanced Lithography 2009 Exhibition
    Design-Process Integration panel discussion




    The Advanced Lithography Exhibition continues to be a focal point for industry connections

     
     Visitors connect with representatives from exhibiting companies at the Advanced Lithography exhibition.
    Exhibit visitors continued to visit booths in numbers similar to last year during the second and final day of this year's show. The trend was one of many encouraging signs at Advanced Lithography, even as the impact of lower travel budgets is being felt across the industry. Among comments heard on the exhibit floor were these:

    "This show is perfect for our market. Even though attendance is down this year overall, look at the popularity of the exhibits. This show rocks. Even in a down year like this, I've got plenty of leads. Some of them are existing customers, some of them are new."

    "This is the single best technical seminar on lithography that we have access to. It brings together material technologies, optics technologies, and now others such as DFM which really is the next step in the scaling that we have to do. We get to meet with our customers, our suppliers, and our colleagues. It's the one spot to catch all three at the same time."

    "We have fewer people here, but our technology roadmap is stronger than ever."

    "I get completely energized when I come to this meeting. What you used to see that was fringe is now product."

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    D for M, or M for D?

     
     On the DfM side, Luigi Capodieci (at right) makes a comment which seems to resonate with Tracy Weed. Mark Mason (not pictured) was the third panelist on the DfM side.
    It was all about taking sides at the Wednesday night Design for Manufacturability through Design-Process Integration panel discussion: Are the goals of improved power, performance, yield, area, and time to market better served by process-aware actions in design … or by design-aware actions in manufacturing?

    Heavily employing humor in making their cases, panels representing the two perspectives staked out opposite sides of the room and encouraged the audience to vote one way or the other.

     
     The MfD perspective side listens attentively to arguments from across the room at Wednesday evening’s panel. From left are Costas Spanos, Tim Bruner, and Sam Sivakumar.
    The “Process Knowledge” case (DfM) was made by Mark Mason of Texas Instruments, Tracy Weed of Synopsys, and Luigi Capodieci of Advanced Micro Devices.

    The “Design Knowledge” case (MfD) was made by Costas Spanos of Univ. of California, Berkeley, Tim Bruner of IBM, and Sam Sivakumar of Intel.

    The final vote went in favor of DfM as the primary driver for continued CMOS scaling. Lars Liebmann of IBM moderated the debate, Vivek Singh of Intel served as timekeeper, and the panel was sponsored by Mentor Graphics.

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    See news from Thursday 26 February