Past Event Overview

SPIE Advanced Lithography 2009 has concluded.

Dates for the 2010 meeting are confirmed:
21 February - 26 February in San Jose, California, USA

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

Advanced Lithography 2009 had high levels of enthusiasm from participants and over 2,700 attendees.

See information on all aspects of the 2009 event:

• View Onsite News, day-by-day highlights from the event.
• Download the Final Program (PDF)
• Read the Invitation from Chairs 
• See the Participant List

The event featured conferences, courses, and an exhibition covering:

• Alternative Lithographic Technologies
• Metrology, Inspection, and Process Control for Microlithography
• Advances in Resist Materials and Processing Technology
• Optical Microlithography
• Design for Manufacturability through Design-Process Integration

Plenary Speakers:

	Lisa T. Su, Senior Vice President and Chief Technology Officer for Freescale Semiconductor, Inc.
	Gilad Almogy, Senior Vice President and General Manager for the Display and Thin Film Solar Products Business Group, Applied Materials, Inc.
	Bernard S. Meyerson, Vice President for Strategic Alliances and Chief Technology Officer, IBM Systems and Technology Group