McPherson, Inc. is pleased to release an x-ray and extreme ultraviolet (EUV) spectrometer, the 251MX, for wavelength dispersive spectral measurements from 0.6 to 20nm (60 to 2000eV.) The McPherson 251MX spectrometer enables simultaneous spectral detection over a wide range, reduces calibration errors, and increases the amount of data collected in a given amount of time. The 251MX features are ideal for many applications: soft x-ray plasma diagnostics, analysis of high order harmonic generated coherent EUV lasers, characterization of extreme ultraviolet sources for high resolution imaging, fabrication or advanced semiconductor lithography processes.
The 251MX provides corrected, flat field spectra with its selection of specially designed diffraction gratings. Data is acquired quickly and easily with direct-detection charge coupled detectors (CCDs.) The clean stainless steel chamber and vacuum-prepared internal components allow efficient pumping for high vacuum or ultra high vacuum (UHV) applications. The 251MX's small footprint simplifies integration to experiment systems. The two available gratings, for 0.6 to 6nm and 5 to 20nm have square groove profiles; the laminar design helps to reduce effects of high diffracted orders. The corrected grating designs deliver high resolution spectra.
The McPherson 251MX advances laboratory soft x-ray and EUV spectral characterization. It enables simultaneous spectral detection over a wide range. The dedicated optical geometry reduces chances for calibration errors, and increases the amount of data collected in a given amount of time.