Welcome to Photomask 2007!
On behalf of SPIE, the Sponsors, and the organizing committee, we would like to welcome you to "The 27th Annual SPIE/BACUS Symposium on Photomask", which is the premier worldwide technical conference and exhibition for the photomask industry. This year's five-day Symposium is held from Monday 17 September through Friday 21 September. The Short Course program on Monday will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. The technical conference is scheduled from Tuesday through Friday. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication. Based on the success of last years special session on "DFM : Are we there yet?", submissions this year warranted a special track on DFM .
The conference will be opened on Tuesday by Rick Wallace, CEO of KLA-Tencor, speaking on the "Collaboration, Innovation, and Execution: Three Keys to Premium Customer Experience". Over the past 18 years, he has held a number of senior management positions within the company. This will provide valuable insight into the changes and challenges that could alter the industry as we know it. Do not miss it!
This year, the conference received over 216 presentation submissions (new record) and we will continue to run full parallel sessions on all 3 days to give you 124 oral presentations compared to 100 in Photomask 2006! The increase in oral presentations is the result of more submissions and changing to the typical presentation length of 20 minutes. This quickens the pace of the conference, allows you to see more of the papers during the sessions, and also better enables you to see the poster session in its entirety.
Tuesday and Wednesday the exhibition will be open. Please stop in and see what's new from the folks that are the backbone of the photomask industry. Without their active participation and support, it would be very difficult to manufacture a photomask.
Closing out the Photomask week on Friday, is the increasingly popular and valuable, overview of the key issues facing the industry. This year's special session is on "Double Patterning Lithography: Challenges and Approaches to Implementation-Twice the Pain for Twice the Gain", will follow previous year's format by addressing the hottest technical issues, development barriers, and potential roadblocks in the form of a review workshop. We have an outstanding series of topics and speakers lined up for this session. Talks are given by IDMs, academia, tool vendors, EDA vendors and state of the art mask shops in world wide. If you are thinking of leaving early, you will miss one of the highlights of the conference. Check the list of invited speakers in the program to see what we mean.
We challenge you to do four things while you are in Monterey… attend and participate in the technical sessions (challenge the authors, question assumptions, and raise the technical sessions to the next level), visit the exhibitions and most of all… have fun surrounded by state-of-the-art technologies and great sea mammals, and let us know your ideas for Photomask 2008!
Welcome to Monterey!
Robert J. Naber
Cadence Design Systems, Inc.
Sony Corp. (Japan)