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6 - 10 October 2008
Monterey Marriott and Monterey Conference Center
Monterey,
California,
USA |
Past Event Overview
The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance hear the latest research on the emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication. 1,100 Attendees 46 Exhibitors 200 Technical Papers
Highlights from Photomask 2008: |
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