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Frits Zernike Award for Microlithography

The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. Honorarium $2,000.

Ralph R. Dammel, AZ Electronics Materials, Sheung Wan, Hong Kong, is the 2015 recipient of the Frits Zernike Award for Microlithography in recognition of his significant contributions to the development of photoresist, anti-reflective coating, and directed self-assembly materials for semiconductor microlithography.

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Merck KGaA Press release

Previous Recipients of the Frits Zernike Award for Microlithography


2014 - Mordechai Rothschild
2013 - David Markle
2012 - John Bruning
2011 - Andrew R. Neureuther
2010 - Marc D. Levenson
2009 - Chris Mack
2008 - Martin van den Brink
2007 - David Williamson
2006 - Timothy Brunner
2005 - C. Grant Willson
2004 - Burn J. Lin

 


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2014 - Mordechai Rothschild

The SPIE Awards Committee has made this recommendation recognition of his leadership in programs that have enabled the advancement of nanolithography in the deep‐UV (248nm and 193nm) and the vacuum‐UV (157nm and 121nm).

SPIE Professional 2014

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2013 - David Markle

The SPIE Awards Committee has made this recommendation in recognition of his pivotal role in the development of numerous lithography tools, including the PerkinElmer Micralign and Micrascan tools and the Ultratech Stepper.

SPIE Professional 2013

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2012 - John Bruning

The SPIE Awards Committee has made this recommendation in recognition of his vision and leadership in the production of metrology instrumentation for the microelectronics, automotive, and optics industries as well as his work in deep-UV excimer projection lithography, phase-measuring interferometry, and die-to-die mask inspection.

SPIE Professional 2012

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2011 - Andrew R. Neureuther

The SPIE Awards Committee has made this recommendation in recognition of his work in lithography physics for semiconductor manufacturing, including electromagnetic scattering, optical imaging, resist profile evolution, defect printability, and phase-sifting masks for precision instruments.

SPIE Professional 2011

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2010 - Marc D. Levenson

The SPIE Awards Committee has made this recommendation recognition of one of the most important developments in lithography resolution enhancement of the last twenty years, the phase shifting mask.

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