Frits Zernike Award for Microlithography

The Frits Zernike Award for Microlithography is given annually for outstanding accomplishments in microlithographic technology, especially those furthering the development of semiconductor lithographic imaging solutions. Honorarium $2,000, sponsored by ASML and Cymer.

John H. Bruning, Pitsford, NY, USA, is the 2012 recipient of the Frits Zernike Award for Microlithography in recognition of his vision and its realization in deep-uv excimer projection lithography, phase-measuring interferometry, die-to-die mask inspection, as well as executive contribution in world-leadership production of specialty precision optical systems and specialized metrology instrumentation for the microelectronics, automotive, and optics industries.

Previous Recipients of the Frits Zernike Award for Microlithography

2011 - Andrew R. Neureuther
2010 - Marc D. Levenson
2009 - Chris Mack
2008 - Martin van den Brink
2007 - David Williamson
2006 - Timothy Brunner
2005 - C. Grant Willson
2004 - Burn J. Lin