Conferences & Exhibitions Calendar
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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Due Dates and SPIE Contacts

Abstract Due Date: 10 August 2009

Author Notification:  19 October 2009

For questions about your presentation or the meeting, contact the Conference Program Coordinator listed below.

For questions about your manuscript, contact the Proceedings Coordinator listed below.

The MySPIE.org Manuscript Submission Site opens for 14 December 2009.

Vol. No.TitleManuscript Due DateProgram CoordinatorProceedings Coordinator
7636Extreme Ultraviolet (EUV) Lithography25-Jan-10Pat WightJenny Woods
7641Design for Manufacturability through Design-Process Integration IV25-Jan-10Pat WightMary Starz
7637Alternative Lithographic Technologies II25-Jan-10Pat WightMirja Salminen
7638Metrology, Inspection, and Process Control for Microlithography XXIV25-Jan-10Pat WightJoel Shields
7639Advances in Resist Materials and Processing Technology XXVII25-Jan-10Pat WightAndrea Heimer
7640Optical Microlithography XXIII25-Jan-10Pat WightMary Starz

 

Important Author Dates

Post-Deadline Submissions
Late abstract submissions may be accepted, subject to chair approval

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

Innovation Starts Here


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