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SPIE Advanced Lithography 12 - 16 February 2012
San Jose Convention Center and San Jose Marriott
San Jose, California, USA

Due Dates and SPIE Contacts

Abstract Due Date: 12 September 2011

Author Notification:  26 October 2011

Manuscript Due Date: 16 January 2012

For questions about your presentation or the meeting, contact the Conference Program Coordinator listed below.

For questions about your manuscript, contact the Proceedings Coordinator listed below. The MySPIE.org Manuscript Submission Site will open  19 December 2011.

 

Vol. No. Title Manuscript Due Date Program Coordinator Proceedings Coordinator
8322 Extreme Ultraviolet (EUV) Lithography III 16-Jan-12 Pat Wight Jenny Woods
8323 Alternative Lithographic Technologies IV 16-Jan-12 Pat Wight Joel Shields
8324 Metrology, Inspection, and Process Control for Microlithography XXVI 16-Jan-12 Pat Wight Kristina Nelson
8325 Advances in Resist Materials and Processing Technology XXIX 16-Jan-12 Pat Wight Pat Wight
8326 Optical Microlithography XXV 16-Jan-12 Pat Wight Andrea Heimer
8327 Design for Manufacturability through Design-Process Integration VI 16-Jan-12 Pat Wight Joel Shields
8328 Advanced Etch Technology for Nanopatterning 16-Jan-12 Pat Wight Joel Shields

 

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Important Author Dates

Late submissions may be accepted at the conference chairs discretion

Author Notification:
26 October 2011

Manuscripts Due:
16 January 2012


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