Conferences & Exhibitions Calendar
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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Hotel + Travel

Discounted rooms are available at the San Jose Marriott and other area hotels.

Detailed hotel and travel information is now available.

Registration and other information about the San Jose Marriott and other hotels.

Information about the San Jose, airport shuttles, taxi, car rental, and San Jose public transportation.

Visa Information and Invitation Requests

Information about internet availability, business services, cashier, message center, speaker check-in desk, course materials desk, marketplace + souvenirs and child care services.

Information on coffee breaks, exhibition desserts, popcorn, cash lunches, and concessions.

Detailed information on SPIE policies: refund, recording, laser pointer safety, underage persons on the exhibition floor, suitcasing, and unsecured items.

Information on San Jose, California, USA where SPIE Advanced Lithography is being held in 2010.

Important Author Dates

Post-Deadline Submissions
Late abstract submissions may be accepted, subject to chair approval

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

Innovation Starts Here


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