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Micro/Nano Lithography

SF-100 XTREME maskless lithography system

Intelligent Micro Patterning, LLC, St. Petersburg, Florida, has announced a new product, the SF-100 XTREME maskless exposure system.

The SF-100 XTREME system expands on the SF-100 ELITE's best features by providing for micropatterning of features as small as 1 micron in size. The SF-100 XTREME is a unique maskless photolithography system that utilizes patented Smart Filter technology licensed by Intelligent Micro Patterning, LLC from the University of South Florida. Smart Filter technology incorporates proprietary, cutting edge micro-optical techniques to rapidly project master images directly onto diverse substrate materials. The SF-100 XTREME then adds highly precise substrate movement and an inline, confocal camera system to improve overall system results, especially when patterning fine features.

Dr. Jay Sasserath, the company's CEO, stated, "The SF-100 XTREME is a natural extension of the SF-100 ELITE maskless lithography system. We've taken the best attributes of the SF-100 ELITE and then expanded on them to provide for small minimum features and more automation on the SF-100 XTREME. We are able to produce these smaller features while still providing the ease of use, low consumable cost, versatility and reliability that Intelligent Micro Patterning products are known for globally. Additionally, the SF-100 XTREME allows the user to customize their system to provide the precise energy levels, exposure wavelengths, and minimum feature sizes for their application. This allows our customers to optimize system performance for their specific microlithography needs."