2008 Programs:
Optical Microlithography Webcast
SPIE Advanced Lithography 2008
Video Interviews from Advanced Lithography 2008
Nigel Farrar, Vice President, Lithography Applications, Cymer, Inc.
Mark Melliar-Smith, CEO, Molecular Imprints, Inc
Serge Montacq, CEO, NANO-UV
Neal Carney, Vice President of Marketing, Tela Innovations
Tracy Weed, Director, Product Marketing, Synopsis, Inc.
2007 Programs:
Hot Topics in Advanced Lithography October 2007
Overview:
Lithography options for 32nm half pitch patterning: Kurt Ronse, IMEC
Sessions:
EUV Lithography: Vivek Bakshi, SEMATECH, Inc.
Immersion Lithography: Donis Flagello, ASML
Double Patterning: Mircea Dusa, ASML
SPIE Advanced Lithography 2007 -Plenary Presentations and Panel Discussion
Nanoscale Patterning Challenges for CMOS Density Scaling
Johannes M.C. (Hans) Stork, Texas Instruments Inc.
Collaborative Innovation: IBM's Immersion Lithography Strategy for 65 nm and 45 nm Half-pitch Nodes & Beyond
George A. Gomba, IBM Corp.
Lithography Beyond 32 nm: A Role for Imprint?
Mark Melliar-Smith, Molecular Imprints, Inc.
Panel Discussion - Virtual Lithography: The Next Generation?
Mircea V. Dusa, ASML
Nigel R. Farrar, CYMER
SST on The Scene - Interviews with Debra Vogler
Harry Levinson, Strategic Lithography Technology
