<?xml version="1.0" encoding="UTF-8"?><rss version="2.0" xml:lang="en-US" xmlns:itunes="http://www.itunes.com/dtds/podcast-1.0.dtd" xmlns:atom="http://www.w3.org/2005/Atom"><channel><title>SPIE Micro/Nano Lithography</title><link>http://www.spie.org/x2402.xml</link><description><![CDATA[Micro/Nano Lithography news feed.]]></description><copyright>Copyright 2009 SPIE</copyright><language>en-us</language><atom:link href="http://www.spie.org/x2402.xml" rel="self" type="application/rss+xml" /><item><title>Integrating optical waveguides with superconducting single-photon detectors</title><description><![CDATA[A new step toward full on-chip integration of active elements (single-photon detectors) and passive elements (quantum photonic circuits) enables important functionalities in quantum information processing.]]></description><link>http://spie.org/x93837.xml</link><pubDate>Fri, 10 May 2013 08:15:00 PDT</pubDate><guid>http://www.spie.org/x93837.xml</guid></item><item><title>Folding photonic nanostructures</title><description><![CDATA[An electron beam lithography and plasma etching process enables hands-free folding of functional metal-patterned dielectric structures with nanoscale dimensions.]]></description><link>http://spie.org/x93543.xml</link><pubDate>Thu, 11 Apr 2013 08:15:00 PDT</pubDate><guid>http://www.spie.org/x93543.xml</guid></item><item><title>Directed self-assembly for ever-smaller printed circuits</title><description><![CDATA[A novel patterning technique directly forms 29nm-pitch fins etched into silicon on insulator, making logic and memory components.]]></description><link>http://spie.org/x93535.xml</link><pubDate>Fri, 05 Apr 2013 07:55:00 PDT</pubDate><guid>http://www.spie.org/x93535.xml</guid></item><item><title>Resist roughness plays a key role in pattern transfer</title><description><![CDATA[A simplified nanoscale etching model reveals how resist sidewall roughness is transferred to the substrate, and suggests simple rules of thumb.]]></description><link>http://spie.org/x93019.xml</link><pubDate>Fri, 29 Mar 2013 08:30:00 PDT</pubDate><guid>http://www.spie.org/x93019.xml</guid></item><item><title>Repairing photomasks by nanomachining</title><description><![CDATA[A nanoscale pit can correct both the amplitude and phase effects of multilayer defects in extreme UV lithography.]]></description><link>http://spie.org/x92901.xml</link><pubDate>Mon, 18 Mar 2013 09:32:00 PDT</pubDate><guid>http://www.spie.org/x92901.xml</guid></item><item><title>Optical defect detector</title><description><![CDATA[KLA-Tencor]]></description><link>http://spie.org/x93763.xml</link><pubDate>Thu, 25 Apr 2013 12:00:00 PDT</pubDate><guid>http://www.spie.org/x93763.xml</guid></item><item><title>At a startup, speed Is essential: panelists talk about how to make it</title><description><![CDATA[SPIE Newsroom]]></description><link>http://spie.org/x93942.xml</link><pubDate>Mon, 13 May 2013 12:00:00 PDT</pubDate><guid>http://www.spie.org/x93942.xml</guid></item></channel></rss>