Conferences & Exhibitions Calendar
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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Exhibitor Product Announcements

Product announcements will be posted as they are received.

6 November 2009: myCD

Abeam Technologies

myCD software is used to analyze an SEM image, extract contours, and find information regarding linewidth of critical dimensions.
The analysis is based on an understanding of physical principles involved in the formation of the SEM signal. Some parameters such as beam voltage and materials should be known to the operator as the input data along with the SEM image.
The results are CDs at the top and bottom of features, LER, LWR, side wall angle.

Find out more or contact Abeam Technologies