San Jose Convention Center
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    24 - 29 February 2008
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    Onsite News - Friday 29 February 2008

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       Record-breaking Attendance at Advanced Lithography

    Advanced Lithography 2008 Sees Record-breaking Session Attendance
    “We’ve heard from attendees that they thought the technical content in the oral and the poster papers was excellent,” said SPIE Advanced Lithography Symposium Chair Roxann Engelstad as the final sessions wrapped up today.

    Engelstad said that both she and Symposium Cochair Christopher Progler also heard highly positive feedback about the quality of the plenary speakers. “They’re experts, and the audience was very interested in what they had to say. You know people are impressed when you see them taking notes in a plenary session.”

    Enthusiasm was high throughout the symposium, which Engelstad characterized as the most important meeting in this field. Nearly 700 papers were presented in five conferences.

    Despite a slight, anticipated decline in overall attendance compared to last year’s record total attendance, numerous records set last year for individual room attendance were broken, notably in the opening plenary as well as in the conference rooms and poster sessions.