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SPIE Advanced Lithography 24 - 29 February 2008
San Jose Convention Center
San Jose, California, USA

Onsite News - Thursday 28 February 2008

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   Panels on Hot Lithography Topics
   


Reference Metrology and Design for Manufacturing Panels
Thursday’s panel on Reference Metrology was organized by NIST and moderated by Ronald Dixson and George Orji. The rapid introduction and complexity of new metrology instruments has created need for advanced reference instruments, agreement on best practices, and development of selection criteria for reference instruments in lithography and films metrology.

The Design for Manufacturing panel on Thursday took an nontraditional approach, borrowing from the popular television talent series “American Idol” with its “DFM Idol” game-show format.

Moderators Mark Mason of Texas Instruments and Juan-Antonio Carballo of Argon Venture Partners used the approach to help the audience “take off the gloves” to get at what the value proposition of DFM really is.



See Friday Onsite News