SPIE is an international society advancing an interdisciplinary approach to the science and application of light.

Advanced Lithography 2009

Information for:

22 - 27 February 2009
San Jose Convention Center and San Jose Marriott
San Jose, CA, USA

Onsite News

See daily news, videos, and photos from the Conferences, Exhibition, Special Events, and more.

Monday 25 February 2008

•	Synergy between Process and Design Plenary speakers D. Mark Durcan, Martin A. van den Brink, and Andrew B. Kahng discuss the advantages of greater integration.
•	New SPIE Fellows/Top Microlithography Awards Announced
•	BACUS Panel Discusses Mask Pricing Top industry experts address rising mask costs.

Tuesday 26 February 2008

•	Video Interview of Neal Carney The Vice President of Marketing for Tela Innovations provides his insight.
•	Video Interview of Tracy Weed Director, Product Marketing, Synopsis, Inc.
•	Women in Optics Leaders Urge Involvement Symposium Chair Roxann Engelstad urged luncheon attendees to get involved in organizing conference programs.
•	Future Projection Lithography: Optical or EUV?

Wednesday 27 February 2008

•	Video Interview of Serge Montacq CEO, NANO-UV.
•	Video Interview of Mark Melliar-Smith CEO, Molecular Imprints, Inc.
•	Video Interview of Nigel Farrar Vice President, Lithography Applications, Cymer, Inc.
•	Student Lunch with the Experts
•	Top Experts "Take off the Gloves" to Address High-interest Issues Moderators from industry and government lead compelling discussions.

Thursday 28 February 2008

•	Panels on Hot Topics in Lithography Lively discussion of Reference Metrology and Design for Manufacturing.

Friday 29 February 2008

•	Record Breaking Attendance this Year Symposium leaders discuss this year's event.