Dr. Burn J. Lin, Senior Director, Nanopatterning Technology, Taiwan Semiconductor Manufacturing Co., Ltd., Taiwan, Republic of China, has been elected to the United States National Academy of Engineering. Lin, an SPIE Fellow and recipient of the SPIE Frits Zernike Award, was recognized for technical innovations and leadership in the development of lithography for semiconductor manufacturing. Lin is editor-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), past chair of the SPIE Advanced Lithography (formerly Microlithography) symposium, author of two book chapters and approximately 80 articles, and holder of 37 U.S. patents.
See The National Academies' press release here.
