SPIE Startup Challenge 2015 Founding Partner - JENOPTIK Get updates from SPIE Newsroom
  • Newsroom Home
  • Astronomy
  • Biomedical Optics & Medical Imaging
  • Defense & Security
  • Electronic Imaging & Signal Processing
  • Illumination & Displays
  • Lasers & Sources
  • Micro/Nano Lithography
  • Nanotechnology
  • Optical Design & Engineering
  • Optoelectronics & Communications
  • Remote Sensing
  • Sensing & Measurement
  • Solar & Alternative Energy
  • Sign up for Newsroom E-Alerts
SPIE Photonics West 2017 | Register Today

SPIE Defense + Commercial Sensing 2017 | Call for Papers

2017 SPIE Optics + Photonics | Call for Papers

Get Down (loaded) - SPIE Journals OPEN ACCESS

SPIE PRESS




Print PageEmail Page

Optical Design & Engineering

Improved features on advanced fabrication software

New aspheric lens tolerancing capabilities based on the work of Optical Research Associates (ORA®) engineer Dr. John Rogers can now be used with the CODE V® 9.81 optical design software from ORA. The CODE V software streamlines the fabrication of optical systems by simplifying the correlation of actual test data and design parameters. Now, the new CODE V Fast Wavefront Differential Tolerancing (TOR) feature can be used to tolerance surface errors that are easily measured in production using surface profilometry. These tolerancing capabilities will be especially valuable in the fabrication of optical elements that are either machined directly in metal or plastic, or, in high-volume production, created from mold inserts that are machined.

In addition, CODE V's ability to utilize measured interferograms of actual lenses has been improved. Specifically, the Fabrication Data analysis feature now provides a way to visualize interferogram data on a lens surface, entrance pupil, or exit pupil, including the ability to see rotation and scaling effects. This simplifies the correlation of measured lens surface deformations or wavefront perturbations with design data.

CODE V 9.81 also delivers enhancements that address the demand for ever smaller features in the microlithographic production of semiconductor wafers. In particular, new software functions provide direct information about the critical dimension (CD) of the image, assuming a one-dimensional, partially coherent image, which is the standard design metric for microlithography.

www.opticalres.com