The Michael Kidger Memorial Scholarship in Optical Design
The Michael Kidger Memorial Scholarship will be awarded to a student engaged in optical design of either imaging or non-imaging systems. For more infomration and to apply, go to www.kidger.com. Deadline is March 31, 2009.
The SPIE scholarship program also includes awards named in honor of individuals or programs. They are:
D.J. Lovell Scholarship ($11,000 annually)
The D.J. Lovell Scholarship is the Society's largest and most prestigious scholarship. This scholarship is sponsored in part by SPIE with contributions from Labsphere, Inc.
John Kiel Scholarship ($10,000 annually)
The John Kiel Scholarship is the Society's second largest scholarship. This scholarship is in honor of SPIE founding member, John Kiel, in recognition of his long-standing and significant contributions to the society. This scholarship is sponsored by SPIE and is awarded for student's potential for long-term contribution to the field of optics and optical engineering.
Laser Technology, Engineering, and Applications Scholarship ($4,000 annually)
The Laser Technology, Engineering, and Applications Scholarship is awarded in recognition of a student's scholarly achievement in laser technology, engineering, or applications. Funds are provided in part by a gift from the former Forum for Military Applications of Directed Energy, and in part by SPIE.
Optical Design and Engineering Scholarship ($3,000 annually)
The Optical Design and Engineering Scholarship was established in honor of Bill Price and Warren Smith, both well-respected members of SPIE's technical community. This scholarship is awarded to a full-time undergraduate or graduate student in the field of optical design and engineering.
BACUS Scholarship ($4,000 annually)
Two BACUS Scholarships in the amount of $2,000 each is awarded to two full-time undergraduate or undergraduate students in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. These scholarships are sponsored by BACUS, the International Technical Group of SPIE dedicated to the advancement of photomask technology.
