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SPIE Photomask Technology 28th Annual Symposium 6 - 10 October 2008
Monterey Marriott and Monterey Conference Center
Monterey, California, USA

Past Event Overview

The most recognized international meeting for presenting innovations in the mask-making industry.  Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business.

  • 1,100 Attendees
  • 42 Exhibitors
  • 200 Technical Papers

Highlights from Photomask 2007:

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