Monterey Conference Center and Monterey Marriott
    Monterey, California, United States
    13 - 16 September 2010
    Print PageEmail Page

    SPIE Photomask Technology | Get the latest research in Mask Making, Emerging Mask Technologies, and Mask Business

    SPIE Photomask Techonology is the largest photomask meeting worldwide. With more than 5,000 attendees, 50 exhibiting companies, a high-level audience, and world-class networking, this meeting has become the premier conference for the mask making industry.

    Review the 2012 Conference 

     • 2012 Final Technical Program (PDF)
     • 2012 Technical Abstracts (PDF)
     • 2012 Exhibition Guide (PDF)