The plenary presentations and a special panel session at this year's SPIE Advanced Lithography conference were captured for webcast and are now available to view anytime-at no charge to you-with the support of CYMER, sponsor of the video coverage.
 | Nanoscale Patterning Challenges for CMOS Density ScalingJohannes M.C. (Hans) Stork, Senior Vice President and Chief Technology Officer, Texas Instruments Inc.
Click here to watch the video
DOI: 10.1117/2.3200703.0001 |
 | Collaborative Innovation: IBM's Immersion Lithography Strategy for 65 nm and 45 nm Half-pitch Nodes & BeyondGeorge A. Gomba, IBM Distinguished Engineer and Director of Lithography Technology Development, IBM Corp.
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DOI: 10.1117/2.3200703.0002 |
 | Lithography Beyond 32 nm: A Role for Imprint?Mark Melliar-Smith, CEO, Molecular Imprints, Inc.
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DOI: 10.1117/2.3200703.0003 |
Panel Discussion - Virtual Lithography: The Next Generation?
Chairs: Mircea V. Dusa, ASML MaskTools and Nigel R. Farrar, CYMER
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In this panel discussion, nine experts discuss the outlook for automated algorithms, engineering analysis and simulation driving next-generation lithography. Panelists include: Andy Neureuther, Univ of California, Berkeley; Alfred Wong, Magma Design Systems; Neal Callan, Brion Technologies, Inc.; Scott Mansfield, IBM Microelectronics Div.; Tatsuhiko Higashiki, Toshiba; Cyrus Tabery, Advanced Micro Devices; Kurt Ronse, IMEC; Steve Renwick, Nikon Precision; and Koichiro Tsujita, Canon.
Video coverage sponsored by CYMER
DOI: 10.1117/2.3200703.0004
