Thank you for attending SPIE Photomask Technology 2016, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business.
Mask Making: Mask data preparation • Substrates, materials, pellicles • Patterning tools and processes • Resist and resist processing • Etch techniques • Metrology • Inspection • Repair • Cleaning, contamination, and haze • Simulation of mask making
Anamorphic Masks for High-NA EUV: Lithograph, OPC, and SMO models • Magnification interactions • Impact of half-field reticles • Stitching for mask making/design
EUV pellicles: Nanoimprint mask making • Nanoimprint mask applications • Pixelated masks • Alternative mask technologies • Grey-scale masks • Direct-write, ML² • Masks for flat panel displays • Masks for MEMs
Mask Business: Mask manufacturing control • Reticle management in the fab and mask shop • Mask management in wafer fabs • Business aspects of masks • Infrastructure challenges
2016 Keynote Presentation
Making Lithography Great
Christopher Progler Chief Technology Officer and Vice President of Strategic Planning Photronics, Inc.
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