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Advanced Lithography 2009
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SPIE Advanced Lithography 22 - 27 February 2009
San Jose Convention Center and San Jose Marriott
San Jose, California, USA

Courses

SPIE Advanced Lithography 2009 features 21 courses and workshops covering everything from lithography and semiconductor fundamentals to emerging techniques and approaches.

Program Tracks

Optical Microlithography

SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); Larry F. Thompson, Consultant (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$555.00 Members  |  $655.00 Non-members
SC102: Optical Lithography Modeling
Date: 22 February 2009
Time: 6:00 PM - 10:00 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Andrew R. Neureuther, Univ. of California/Berkeley (United States); Mark D. Smith, KLA-Tencor Corp. (United States)
$270.00 Members  |  $320.00 Non-members
SC116: Lithographic Optimization: A Theoretical Approach
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chris A. Mack, Consultant (United States)
$530.00 Members  |  $630.00 Non-members
SC117: The Fundamental Limits of Optical Lithography
Date: 22 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Bruce W. Smith, Rochester Institute of Technology (United States)
$380.00 Members  |  $430.00 Non-members
SC118: Anti-Reflective Coatings: Theory and Practice
Date: 26 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Ralph R. Dammel, AZ Electronic Materials USA Corp (United States)
$270.00 Members  |  $320.00 Non-members
SC120: 193-nm Photoresist Materials
Date: 22 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Ralph R. Dammel, AZ Electronic Materials USA Corp (United States)
$270.00 Members  |  $320.00 Non-members
SC124: Pushing the Limits: Hyper-NA, Immersion, Polarization, and Pitch Division (Double Patterning) in Optical Lithography
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Bruce W. Smith, Rochester Institute of Technology (United States)
$270.00 Members  |  $320.00 Non-members
SC706: Imaging and Optics Fundamentals in Advanced Lithography
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Donis G. Flagello, ASM Lithography (United States)
$270.00 Members  |  $320.00 Non-members
SC707: Basics of Optical Imaging in Microlithography: A Hands-on Approach
Date: 22 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Thomas D. Milster, Optical Sciences Ctr./Univ. of Arizona (United States); Peter D. Brooker, Sigma-C (United States); Robert J. Socha, ASML MaskTools Inc. (United States)
$270.00 Members  |  $320.00 Non-members
SC833: Lithography Integration for Semiconductor Back-End-Of-The-Line (BEOL)
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Qinghuang Lin, IBM Thomas J. Watson Research Ctr. (United States)
$270.00 Members  |  $320.00 Non-members
SC885: Principles and Practical Implementation of Double Patterning
Date: 23 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Mircea V. Dusa, ASML US, Inc. (United States)
$475.00 Members  |  $575.00 Non-members
SC886: Line Edge Roughness
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Gregg M. Gallatin, Applied Math Solutions, LLC (United States)
$270.00 Members  |  $320.00 Non-members
SC887: Modeling Exposure Tools for OPC and Tooling Analysis
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kafai Lai, IBM Microelectronics Div. (United States)
$475.00 Members  |  $575.00 Non-members
SC889: Layout-Aware Circuit Analysis
Date: 25 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Rama N. Singh, Fook-Luen Heng, Aditya Bansal, IBM Thomas J. Watson Research Ctr. (United States)
$270.00 Members  |  $320.00 Non-members
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Advances in Resist Materials and Processing Technology

SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); Larry F. Thompson, Consultant (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$555.00 Members  |  $655.00 Non-members
SC103: Chemically Amplified Resists
Date: 26 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: C. Grant Willson, Univ. of Texas/Austin (United States)
$475.00 Members  |  $575.00 Non-members
SC616: Practical Photoresist Processing
Date: 26 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Ralph R. Dammel, AZ Electronic Materials USA Corp. (United States)
$270.00 Members  |  $320.00 Non-members
SC780: Tracks 101: Microlithography Coat and Develop Basics
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Joseph W. Daggett, Daniel J. Williams, Sumika Electronic Materials, Inc. (United States)
$475.00 Members  |  $575.00 Non-members
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Alternative Lithographic Technologies

SC888: EUV Lithography
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Vivek Bakshi, EUV Litho, Inc. (United States); Jinho Ahn, Hanyang Univ. (South Korea); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
$690.00 Members  |  $790.00 Non-members
SC622: Nano-Scale Patterning with Imprint Lithography
Date: 22 February 2009
Time: 6:00 PM - 10:00 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: S.V. Sreenivasan, Molecular Imprints, Inc. (United States); C. Grant Willson, The Univ. of Texas at Austin (United States); Douglas J. Resnick, Molecular Imprints, Inc. (United States)
$270.00 Members  |  $320.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); Larry F. Thompson, Consultant (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$555.00 Members  |  $655.00 Non-members
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Design for Manufacturability through Design-Process Integration

SC942: Design-Technology CoOptimization to Combat Escalating Manufacturability and Design Challenges
Date: 24 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Lars W. Liebmann, IBM Microelectronics Div. (United States); Larry Pileggi, PDF Solutions, Inc. (United States)
$270.00 Members  |  $320.00 Non-members
SC889: Layout-Aware Circuit Analysis
Date: 25 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Rama N. Singh, Fook-Luen Heng, Aditya Bansal, IBM Thomas J. Watson Research Ctr. (United States)
$270.00 Members  |  $320.00 Non-members
SC887: Modeling Exposure Tools for OPC and Tooling Analysis
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kafai Lai, IBM Microelectronics Div. (United States)
$475.00 Members  |  $575.00 Non-members
SC885: Principles and Practical Implementation of Double Patterning
Date: 23 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Mircea V. Dusa, ASML US, Inc. (United States)
$475.00 Members  |  $575.00 Non-members
SC833: Lithography Integration for Semiconductor Back-End-Of-The-Line (BEOL)
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Qinghuang Lin, IBM Thomas J. Watson Research Ctr. (United States)
$270.00 Members  |  $320.00 Non-members
SC116: Lithographic Optimization: A Theoretical Approach
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chris A. Mack, Consultant (United States)
$530.00 Members  |  $630.00 Non-members
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Metrology, Inspection, and Process Control for Microlithography

SC943: Basics of In-Line Critical Dimension Metrology
Date: 22 February 2009
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Vladimir A. Ukraintsev, Veeco Instruments Inc. (United States)
$270.00 Members  |  $320.00 Non-members
SC705: Instruments and Methodologies for Accurate Metrology and Fleet Matching
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chas Archie, IBM Microelectronics Div. (United States); Bill Banke, Jr., IBM Corp. (United States)
$270.00 Members  |  $320.00 Non-members
SC886: Line Edge Roughness
Date: 22 February 2009
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Gregg M. Gallatin, Applied Math Solutions, LLC (United States)
$270.00 Members  |  $320.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 22 February 2009
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); Larry F. Thompson, Consultant (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$555.00 Members  |  $655.00 Non-members
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