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Advanced Lithography 2010
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SPIE Advanced Lithography 21 - 25 February 2010
San Jose Convention Center
San Jose, California, USA

Courses

SPIE Advanced Lithography 2010 features 21 courses and workshops covering everything from lithography and semiconductor fundamentals to emerging techniques and approaches.

Course prices increase $50 after 5 February.

Program Tracks

Advances in Resist Materials and Processing Technology

SC616: Practical Photoresist Processing
Date: 25 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Ralph R. Dammel, AZ Electronic Materials USA Corp. (United States)
$285.00 Members  |  $335.00 Non-members
SC103: Chemically Amplified Resists
Date: 25 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: C. Grant Willson, Univ. of Texas/Austin (United States)
$490.00 Members  |  $590.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$490.00 Members  |  $590.00 Non-members
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Extreme Ultraviolet (EUV) Lithography

SC888: EUV Lithography
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Vivek Bakshi, EUV Litho, Inc. (United States); Jinho Ahn, Hanyang Univ. (South Korea); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
$705.00 Members  |  $805.00 Non-members
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Metrology, Inspection, and Process Control for Microlithography

SC988: Identifying and Controlling Micro-contamination in Critical Environments
Date: 21 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Brian J. Grenon, Grenon Consulting, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC705: Instruments and Methodologies for Accurate Metrology and Fleet Matching
Date: 21 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chas Archie, IBM Corp. (United States); Bill Banke, Jr., Consultant (United States)
$285.00 Members  |  $335.00 Non-members
SC943: Basics of In-Line Critical Dimension Metrology
Date: 21 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Vladimir A. Ukraintsev, Nanometrology International, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC886: Line Edge Roughness
Date: 21 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Gregg M. Gallatin, NIST Center for Nanoscale Science and Technology (United States)
$285.00 Members  |  $335.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$490.00 Members  |  $590.00 Non-members
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Design for Manufacturability through Design-Process Integration

SC989: DfM: Profitable Scaling through Design-Technology Co-Optimization
Status: Course Canceled
Date: 24 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Lars W. Liebmann, IBM Corp. (United States); Kuang-Kuo Lin, Chartered Semiconductor Manufacturing, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC887: Modeling of Exposure Tools for OPC and Tooling Analysis
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kafai Lai, IBM Corp. (United States)
$490.00 Members  |  $590.00 Non-members
SC992: Lithography Integration for Semiconductor FEOL & BEOL Fabrication
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Qinghuang Lin, Ying Zhang, IBM Thomas J. Watson Research Ctr. (United States)
$490.00 Members  |  $590.00 Non-members
SC116: Lithographic Optimization: A Theoretical Approach
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chris A. Mack, Consultant (United States)
$540.00 Members  |  $640.00 Non-members
SC885: Principles and Practical Implementation of Double Patterning
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Mircea V. Dusa, ASML US, Inc. (United States); Stephen D. Hsu, Brion Technologies, Inc. (United States)
$490.00 Members  |  $590.00 Non-members
SC990: Optical Proximity Correction for Current and Future Nodes
Date: 22 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kevin Lucas, Synopsys, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
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Alternative Lithographic Technologies

SC991: Electron Beam Lithography using Massively Parallel Pixel Projection
Date: 21 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Hans C. Pfeiffer, HCP Consulting Services (United States)
$285.00 Members  |  $335.00 Non-members
SC622: Nano-Scale Patterning with Imprint Lithography
Date: 21 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: S. V. Sreenivasan, Molecular Imprints, Inc. (United States); C. Grant Willson, The Univ. of Texas at Austin (United States); Douglas J. Resnick, Molecular Imprints, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC888: EUV Lithography
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Vivek Bakshi, EUV Litho, Inc. (United States); Jinho Ahn, Hanyang Univ. (South Korea); Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
$705.00 Members  |  $805.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$490.00 Members  |  $590.00 Non-members
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Optical Microlithography

SC992: Lithography Integration for Semiconductor FEOL & BEOL Fabrication
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Qinghuang Lin, Ying Zhang, IBM Thomas J. Watson Research Ctr. (United States)
$490.00 Members  |  $590.00 Non-members
SC990: Optical Proximity Correction for Current and Future Nodes
Date: 22 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kevin Lucas, Synopsys, Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC101: Introduction to Microlithography: Theory, Materials, and Processing
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Murrae J. Bowden, EMP Consulting (United States); C. Grant Willson, Univ. of Texas/Austin (United States)
$490.00 Members  |  $590.00 Non-members
SC102: Optical Lithography Modeling
Date: 21 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Advanced
Instructor: Andrew R. Neureuther, Univ. of California, Berkeley (United States); Mark D. Smith, KLA-Tencor Corp. (United States)
$285.00 Members  |  $335.00 Non-members
SC707: Basics of Optical Imaging in Microlithography: A Hands-on Approach
Date: 21 February 2010
Time: 8:30 AM - 12:30 PM
Location: San Jose, United States
Course Level: Introductory
Instructor: Thomas D. Milster, College of Optical Sciences, The Univ. of Arizona (United States); Peter D. Brooker, Synopsys (United States); Robert J. Socha, ASML MaskTools Inc. (United States)
$285.00 Members  |  $335.00 Non-members
SC116: Lithographic Optimization: A Theoretical Approach
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Chris A. Mack, Consultant (United States)
$540.00 Members  |  $640.00 Non-members
SC885: Principles and Practical Implementation of Double Patterning
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Mircea V. Dusa, ASML US, Inc. (United States); Stephen D. Hsu, Brion Technologies, Inc. (United States)
$490.00 Members  |  $590.00 Non-members
SC886: Line Edge Roughness
Date: 21 February 2010
Time: 1:30 PM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Gregg M. Gallatin, NIST Center for Nanoscale Science and Technology (United States)
$285.00 Members  |  $335.00 Non-members
SC887: Modeling of Exposure Tools for OPC and Tooling Analysis
Date: 21 February 2010
Time: 8:30 AM - 5:30 PM
Location: San Jose, United States
Course Level: Intermediate
Instructor: Kafai Lai, IBM Corp. (United States)
$490.00 Members  |  $590.00 Non-members
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Important Author Dates

Post-Deadline Submissions
Late abstract submissions may be accepted, subject to chair approval

Author Notification:
19 October 2009

Manuscripts Due:
25 January 2010


Symposium Chair

Christopher J. Progler, Photronics Inc.

Symposium Co-chair

Donis G. Flagello, Nikon Research Corp. of America

Innovation Starts Here

Browse Advanced Lithography 2009 papers
Advanced Lithography 2009 papers


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