• Advanced Lithography 2015
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
22 - 26 February 2015
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Welcome

The continuation of lithography-enabled Moore's Law scaling is being challenged as never before. While solving the technical problems associated with extending immersion lithography and bringing EUV lithography and other new technologies to production readiness, lithographers are increasingly challenged with finding solutions that are cost-effective. Success will demand unprecedented ingenuity, cost efficiency and communication within the lithography community and across interdisciplinary lines. 

For the past 38 years, SPIE Advanced Lithography has played a key role in bringing the lithography and broader patterning community together to solve challenges required by the semiconductor industry. Symposium participants come from an extensive array of backgrounds to share and learn about state-of-the-art lithographic tools, resists, metrology, processes, and design and process integration. Through a series of provocative panel discussions and seminars, the symposium further probes current issues to be faced as we extend these technologies or try to switch to alternative technologies.

The symposium is organized into seven conferences:

* Alternative Lithographic Technologies
* Extreme Ultraviolet Lithography
* Metrology, Inspection, and Process Control for Microlithography
* Advances in Patterning Materials and Processing Technology
* Optical Microlithography
* Design-Process-Technology Co-Optimization for Manufacturability
* Advanced Etch Technology for Nanopatterning

All conferences are organized by current practitioners of the art, and numerous short courses are taught by recognized industry experts. In keeping with the interdisciplinary nature of lithography, there are several joint sessions which cover topics relevant to multiple conferences. Additional information is available from the many manufacturers' exhibits, which allow tool makers, EDA suppliers, and material suppliers to showcase new products while interacting one-on-one with customers.

We welcome you to the San Jose Convention Center, San Jose, California for the SPIE Advanced Lithography's 39th year.

 

Harry J. Levinson
GLOBALFOUNDRIES Inc.
2014 Symposium Chair

 

Mircea V. Dusa
ASML US, Inc.

2014 Symposium Co-Chair

 

 

Executive Committee
Christopher Bencher, Applied Materials, Inc.
Jason P. Cain, Advanced Micro Devices, Inc.
Luigi Capodieci, GLOBALFOUNDRIES Inc. Inc.
Mircea V. Dusa, ASML US, Inc.
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology
Christoph K. Hohle, Fraunhofer Institute for Photonic Microsystems
Kafai Lai, IBM Corp.
Harry J. Levinson, GLOBALFOUNDRIES Inc.
Qinghuang Lin, IBM Thomas J. Watson Research Ctr.
Gottlieb S. Oehrlein, Univ. of Maryland, College Park
Eric M. Panning, Intel Corp.
Douglas J. Resnick, Molecular Imprints, Inc.
Martha I. Sanchez, IBM Research - Almaden
John L. Sturtevant, Mentor Graphics Corp.
Thomas I. Wallow, GLOBALFOUNDRIES Inc.
Obert R. Wood II, GLOBALFOUNDRIES Inc.

Advisory Committee
Robert D. Allen, IBM Almaden Research Ctr.
William H. Arnold, ASML US, Inc.
Timothy A. Brunner, IBM Thomas J. Watson Research Ctr.
Ralph R. Dammel, AZ Electronic Materials USA Corp.
Roxann L. Engelstad, Univ. of Wisconsin, Madison
Donis G. Flagello, Nikon Research Corp. of America
Harry J. Levinson, GLOBALFOUNDRIES Inc.

Burn Lin, Taiwan Semiconductor Manufacturing Co., Ltd.
Chris A. Mack, lithoguru.com
Wilhelm Maurer, Infineon Technologies AG
Christopher J. Progler, Photronics, Inc.
Michael T. Postek, National Institute of Standards and Technology
Luc Van den hove, IMEC
C. Grant Willson, The Univ. of Texas at Austin
Anthony Yen, Taiwan Semiconductor Manufacturing Co., Ltd.

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