San Jose Marriott and San Jose Convention Center San Jose,
United States 22 - 26 February 2015
Plan to attend the premier semiconductor lithography event
SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.
Late abstracts may be accepted, subject to chair approval. Contact Pat Wight. If submitting a late abstract, please specify the individual conference.
My Year as SPIE President: What Does the Society Do and Who Makes It Happen?
William H. Arnold Chief Scientist and VP of Technology Development Center, ASML 2013 SPIE President
Making the Impossible: Dealing with Patterns Throughout the Design and Manufacturing Flow
Joseph Sawicki VP and GM, Design-to-Silicon Division, Mentor Graphics Corp.
Beyond Scaling: Opportunities and Approaches
Akihisa Sekiguchi Corporate VP and Deputy General Manager, Tokyo Electron Ltd.
Plenaries sponsored by:
The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.