• Advanced Lithography 2015
    Special Events
    Travel to San Jose
    For Authors/Presenters
    For Chairs/Committees
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San Jose Marriott and San Jose Convention Center
San Jose, California, United States
22 - 26 February 2015
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Plan to attend the premier semiconductor lithography event

See what happened in 2014: onsite news and photos

SPIE Advanced Lithography, the premier conference for the lithography community. For 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.

Late abstracts may be accepted, subject to chair approval. Contact Pat Wight. If submitting a late abstract, please specify the individual conference.

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Prices increase after 6 February 2015

A variety of events, all in one week
600 presentationsspecial events * courses * exhibition

Advance Program (PDF coming soon)

2015 Conference Topic Areas
Extreme Ultraviolet (EUV) Lithography
Alternative Lithographic Technologies
Metrology, Inspection, and Process Control for Microlithography
Advances in Patterning Materials and Processes
Optical Microlithography
Design-Process-Technology Co-optimization for Manufacturability
Advanced Etch Technology for Nanopatterning
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2014 Plenary Speakers
 William H. Arnold, ASML

My Year as SPIE President: What Does the Society Do and Who Makes It Happen?

William H. Arnold
Chief Scientist and VP of Technology Development Center, ASML
2013 SPIE President

 Joseph Sawicki, Mentor Graphics

Making the Impossible: Dealing with Patterns Throughout the Design and Manufacturing Flow

Joseph Sawicki
VP and GM, Design-to-Silicon Division,
Mentor Graphics Corp.

 Akihisa Sekiguchi, Tokyo Electron Ltd.

Beyond Scaling: Opportunities and Approaches

Akihisa Sekiguchi
Corporate VP and Deputy General Manager,
Tokyo Electron Ltd.

Plenaries sponsored by:
The Advanced Lithography Exhibition
Come meet the industry's top semiconductor suppliers, integrators, and manufacturers. For 40 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications and the exhibition is where you can see the latest products and meet with the leaders in the field.
Learn more on the Exhibition website

SPIE.TV: The latest advances in lithography


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Important Author Dates

Abstract Due Date
Late abstracts may be accepted

Author Notification
24 October 2014

Manuscripts Due
26 January 2015

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