SPIE Advanced Lithography

Call for papers opens in May

SPIE Advanced Lithography is the world's premier semiconductor lithography conference and exhibition. The 2013 event is scheduled for 24-28 February, in San Jose, California.

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In the business? Take part in the Advanced Lithography Exhibition, a highly regarded exhibition for the industry's top semiconductor suppliers, integrators, and manufacturers.

A look back at Advanced Lithography 2012

This year's event ended Thursday 16 February after a five-day run in San Jose.

• Read news, and see photos

• Final Program (PDF)

• Technical Abstracts

• Exhitibition Guide (PDF)

More than 600 presentations highlighted the latest research

• Advanced Etch Technology for Nanopatterning

• Extreme Ultraviolet (EUV) Lithography

• Alternative Lithographic Technologies

• Metrology, Inspection, and Process Control for Microlithography

• Advances in Resist Materials and Processing Technology

• Optical Microlithography

• Design for Manufacturability through Design-Process Integration

2012 plenary speakers

Jim Clifford

Vice President and GM, CDMA Technologies (USA)

The Mobile Wireless Phenomenon: A Continued Need for Advanced Lithography

C. Grant Willson

Professor of Chemical Engineering, University of Texas at Austin (USA)

High-Resolution Patterning: A View of the Future

Christopher J. Progler

Chief Technology Officer, Photronics Inc. (USA)

Squares Do Not Make Good Frisbees

Advanced Lithography 2012 from SPIE.TV

Call for Papers now open | EUV, Optical, Resists, Patterning, Metrology, Imprint

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