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    Author Submission & Chair Review System


    Photomask Japan 2014: Photomask and Next Generation Lithography Mask Technology

    Dates: 15-16 April 2014

    Location: Yokohama, Japan


    Manuscript submissions for Photomask Japan (PMJ14) will go through the SPIE Submission and Review System.

    Submit Your Manuscript

    You will be asked to provide information about your submission, including complete author information.

    An account is required to submit an manuscript, or review manuscript submissions for this conference. You can create an account when you click on the link below, or if you already have an SPIE account, you can sign in:


    PMJ14: Photomask Japan 2014: Photomask and Next Generation Lithography Mask Technology  

    Manuscripts Due: 12 March 2014

    Manage Your Active Submissions

    Authors:
    Complete your submission, submit a revision, or view the status of your manuscript.

    Chairs and Committee Members: Access and review manuscripts.

    If you have questions about the submission process, please contact Michelle Jefferson, SPIE Proceedings Coordinator, michellej@spie.org, or call +1 360 685 5479. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.

    If you have questions about the meeting, please see the meeting website at http://www.photomask-japan.org/index.html