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    EMLC 2014 Submission & Chair Review System


    30th European Mask and Lithography Conference (EMLC 2014)
    Dates: 24-25 June 2014
    Location: Dresden, Germany

     Paper submissions will go through the SPIE Paper Submission and Review System.

    Submit Your Abstract

    An account is required to submit an abstract, or review abstract submissions for this conference. You can create an account when you click on the link below, or if you already have an SPIE account, you can sign in:

    EMLC 2014

    Due Date: 
    Deadline for Abstract Submission: 21 March 2014

    Manage Your Active Submissions

    Complete your submission, submit a revision, or view the status of your abstract.

    Chairs and Committee Members: Access and review abstracts.

    If you have questions about the submission process, please contact Jenny Woods, SPIE Proceedings Coordinator,, or call +1 360 676-3290. SPIE hours are Monday-Friday, 8 am to 5 pm Pacific Time.

    If you have questions about the meeting, please see the meeting website at