Share Your Research in Forensics, Environmental Safety and Health, Biological Materials, Helium Ion Microscopy

Submit your research to SPIE Scanning Microscopy 2010,
a multidisciplinary forum that seeks to advance scanning microscopy technologies and applications.

Papers will be accepted in these areas:


•	Forensics
•	Helium Ion Microscopy
•	Atomic Force and Scanned Probe Microscopies
•	Microscopy and Analysis of Biological Materials
•	Sample Preparation Technology
•	Microscopy and Analysis of Food Microstructures
•	Microscopy Applications in Environmental Safety and Health
•	Focused Ion Beam Microscopy
•	Microspectroscopic Characterization with Multiple Probes
•	Optical Characterization of Biological Materials
•	Scanning Electron Microscopies
•	Applications of Scanning Microscopy to Forensics Science
•	Electron Beam Interaction Modeling Workshop
•	Discussion of NIST DTSA-II for Spectral Modeling

View Call for Papers (pdf)

Participate at SPIE Scanning Microscopy 2010
The conference for scientists and researchers to share ideas and find technical solutions, funding sources, and personal connections that help ensure their success.

SPIE Scanning Microscopy 2009 concluded on Thursday 7 May

SPIE would like to express its deepest appreciation to the symposium chairs, conference chairs, program committees, and session chairs who have so generously given of their time and advice to make this symposium possible.

View Final Progam (pdf)

View "Sessions at a Glance" Program (49 kb pdf)

2009 presentations topics:


•	Helium Ion Microscopy
•	Atomic Force and Scanned Probe Microscopies
•	Microscopy and Analysis of Biological Materials
•	Sample Preparation Technology
•	Microscopy and Analysis of Food Microstructures
•	Microscopy Applications in Environmental Safety and Health
•	Focused Ion Beam Microscopy
•	Microspectroscopic Characterization with Multiple Probes
•	Optical Characterization of Biological Materials
•	Scanning Electron Microscopies
•	Applications of Scanning Microscopy to Forensics Science
•	Electron Beam Interaction Modeling Workshop
•	Discussion of NIST DTSA-II for Spectral Modeling
•	Plus a Forensics Forum

Courses:


•	Scanning Microscopy in Forensic Science
•	Software for Scanning Microscopy
•	Basics and Industrial Applications of AFM

Plenary Session - Tuesday 5 May

New prospects for electron beams as tools for semiconductor lithography
Tuesday 5 May
8:40 to 9:20 am

Hans C. Pfeiffer, Retired IBM. Currently a consultant in the area of electron optics for lithography, inspection and test (USA)

XHR SEM: Enabling extreme high resolution scanning electron microscopy
Tuesday 5 May
9:20 to 10:00 am

Richard Young, NanoElectronics Market Division at FEI (USA)

Critical points of materials are a universal property characterizing every element and their compounds
Tuesday 5 May
10:00 to 10:40 am

A.J. Tousimis, Tousimis Research Corporation, Inc. (USA)

Technical Event on Thursday:


•	Forensics Forum

Share Your Research in Forensics, Environmental Safety and Health, Biological Materials, Helium Ion Microscopy

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