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Mr. William Arnold

Mr. William Arnold

ASML US Inc
Fellow Member
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SPIE Involvement: Board of Directors | Executive Committee | Publications Committee | Strategic Planning Committee | Symposia Committee | Corporate and Exhibitor Committee | Nominating Committee | Financial Advisory Committee | Fellow status | Symposium Chair | Symposium Committee | Conference Chair | Editor | Author
Profile Summary
William H. Arnold
Chief Scientist, and Vice President of Technology Development Center, ASML.

Education
MS in Physics, University of Chicago
BA in Physics, Hampshire College

Technical Activities/Interests
• Optical and EUV lithography; semiconductor devices and chip manufacturing; nanoscale processing for future electronic and photonics devices

Service to the Technical Community
• Micro and Nanoengineering (MNE) Organizing Committee, 1998-2010
• International Society of Semiconductor Manufacturers (ISSM) Organizing Committee, 2006-2010
• 193 nm Symposium Organizing Committee, 1995-1998
• 157 nm Symposium Organizing Committee, 1999-2002
• Next Generation Lithography Working Group, 1997-2001
• VLSI Symposium Program Committee, 1998-2000
• SIA Lithography Technical Working Group Co-Chairman 1996-97
• Technical Advisory Board (TAB); Sematech, to define US lithography roadmap, 1988-97; Sematech Lithography Focus TAB Chairman 1992-93
• Member IEEE (since 1992); Member OSA (since 1996)
• Author of >100 technical papers, book chapters, and short courses on microlithography and metrology for semiconductor devices
• Many book and paper reviews
• Numerous invited talks and panels (IEDM, VLSI, VLSI-TSA, ESSDRC)

Services to SPIE
• Member of SPIE (since 1983)
• Member of SPIE Board of Directors, 2004-2007
• Senior Editor, Microlithography, Journal of Micro/Nanolithography, MEMs, and MOEMs (JM3), 2002-2010
• Advisory Committee Advanced Lithography Symposium - 1988-2010
• Chairman, Publications Committee, 2004-2008
• Publications Committee 2001-2009
• Symposium Committee 1996-1998, 2004-2007
• Frits Zernike Microlithography Award Committee 2002-2004
• Microlithography Symposium – Chairman 1994-95, Vice Chairman 1992-93
• Integrated Circuit Metrology, Inspection, and Process Control – Chairman 1990-1991, Vice Chairman 1988-1989, Conference Committee 1986-1993
• Editor, Integrated Circuit Metrology, Inspection, and Process Control IV, Proc
Publications   Most recent | Show all (21)
Metrology in times of shrinking budgets (Conference Proceedings)
Metrology in times of shrinking budgets  (Conference Proceedings)
Authors: William Arnold
Published: 10 Apr 2013
Challenges for 1x nm-device fabrication using EUVL: scanner and mask (Conference Proceedings)
Challenges for 1x nm-device fabrication using EUVL: scanner and mask  (Conference Proceedings)
Authors: William Arnold
Published: 14 Oct 2011
Guest Editorial: Double-Patterning Lithography (Journal Paper)
Free Access 
Guest Editorial: Double-Patterning Lithography  (Journal Paper)
Authors: William Arnold
Published: 01 Jan 2009
The lithography technology for the 32 nm HP and beyond (Conference Proceedings)
The lithography technology for the 32 nm HP and beyond  (Conference Proceedings)
Authors: Mircea Dusa, Bill Arnold, Jo Finders, et al.
Published: 19 May 2008
Toward 3nm overlay and critical dimension uniformity: an integrated error budget for double patterning lithography (Conference Proceedings)
Conference Committee Involvement   Most recent | Show all (14)
SPIE Advanced Lithography  
24 February 2013
San Jose, California, USA
SPIE Advanced Lithography  
12 February 2012
San Jose, California, USA
SPIE Advanced Lithography  
27 February 2011
San Jose, California, USA
SPIE Advanced Lithography  
22 February 2009
San Jose, California, USA
SPIE Advanced Lithography  
24 February 2008
San Jose, California, USA

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